2014
DOI: 10.1016/j.spmi.2014.10.018
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The study on characterizations of SrTiO3 thin films with different growth temperatures

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Cited by 21 publications
(7 citation statements)
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“…3, TiN4). The result was also similar to Kınacı's work [28] that the roughness root mean square (RMS) value of the RF magnetron sputtered SrTiO 3 film increased from 0.295 nm at the temperature of 200 • C to 1.195 nm at 500 • C. It can be noted that the surface of films becomes rougher with the elevation of the substrate temperatures Fig. 4 gives the critical load, nanoindentation hardness and elastic modulus of TiN films deposited at different substrate temperatures.…”
Section: Microstructure and Surface Morphology Analysissupporting
confidence: 90%
“…3, TiN4). The result was also similar to Kınacı's work [28] that the roughness root mean square (RMS) value of the RF magnetron sputtered SrTiO 3 film increased from 0.295 nm at the temperature of 200 • C to 1.195 nm at 500 • C. It can be noted that the surface of films becomes rougher with the elevation of the substrate temperatures Fig. 4 gives the critical load, nanoindentation hardness and elastic modulus of TiN films deposited at different substrate temperatures.…”
Section: Microstructure and Surface Morphology Analysissupporting
confidence: 90%
“…All RT-grown STO samples were amorphous in their as-deposited state, as determined by GIXRD measurements. GIXRD patterns of as-deposited STO 20 , annealed STO 0 , STO 10 and STO 20 films are demonstrated in [26,27,30]. The calculated lattice parameter a was slightly higher than that given in the ICSD reference (i.e., 3.9110 Å)…”
Section: Film Morphology and Structurementioning
confidence: 94%
“…Furthermore, in nanostructured thin film form they have ability to show multifunctional properties [18]. STO nanostructured thin films have been deposited on a variety of substrates using various deposition techniques including electron cyclotron resonance (ECR) ion beam sputtering [19], atomic layer deposition [20], pulsed laser deposition [21,22], molecular beam epitaxy [23], metal organic chemical vapor deposition [24], and sputtering [1,[25][26][27]. Among these methods, sputtering is simple, low cost and effective thin film growth technique which is compatible for industrial scale as well.…”
Section: Introductionmentioning
confidence: 99%
“…This might be originating from lower deposition temperature. 30 It is known that different substrate temperatures and/or annealing temperatures produce different material characteristics. [31][32][33][34][35] Survey and high-resolution XPS scans of STO films were recorded as a function of annealing temperature and time.…”
Section: Resultsmentioning
confidence: 99%