Abstract:The investigation of diffusion processes in metallic melts is of great interest for liquid phase epitaxial development. However, there has not been until now reasonable concordance between experimental data on diffusion coefficients even for the most studied semiconductor systems. Evidently, this is connected with indirect approach to the solution of the diffusion problem. According to such an approach the calculation of diffusion coefficients is performed as a rule using the kinetic characteristics of solutio… Show more
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