A new technique of barrier formation in thin film
normalCdS:CuxS
solar cells by chemiplating under the influence of a negative dc potential at the
normalCdS
film is described. In cells thus formed, excessive grain boundary junction intrusions can be prevented, as demonstrated through a study of their dark I–V behavior, spectral dependence, and AES compositional depth profile. Such processed cells have shown high reverse breakdown voltages, a pronounced spectral response, a better long term stability, and a record open‐circuit voltage of 0.558V. A model of growth of
CuxS
, in terms of effect of forming potentials over the relative kinetics of reacting Cu+ and Cd++ ionic species, is also discussed.