The significance of redeposition and backscattering in nanostructure formation by focused ion beams

Lindsey, S.; Hobler, G.

doi:10.1016/j.nimb.2011.08.051

Cited by 18 publications

(9 citation statements)

References 17 publications

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“…Patterning of the stencil masks was performed by direct Ga ), but a non-trivial interplay between multiple effects that include sputtering, atomic recoil, redeposition, and ion implantation 36,37 . While holes with diameters as small as 3 nm have been reported with Ga + ion beams, the fabrication of holes with diameters smaller than the beam width is often less repeatable due to a significant increase in sensitivity of the hole diameter to the ion beam dose 38 .…”

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confidence: 99%

High resolution fabrication of nanostructures using controlled proximity nanostencil lithography

Jain

Aernecke

Liberman

et al. 2014

Applied Physics Letters

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Nanostencil lithography has a number of distinct benefits that make it an attractive nanofabrication processes, but the inability to fabricate features with nanometer precision has significantly limited its utility. In this paper, we describe a nanostencil lithography process that provides sub-15 nm resolution even for 40-nm thick structures by using a sacrificial layer to control the proximity between the stencil and substrate, thereby enhancing the correspondence between nanostencil patterns and fabricated nanostructures. We anticipate that controlled proximity nanostencil lithography will provide an environmentally stable, clean, and positive-tone candidate for fabrication of nanostructures with high-resolution.Significant advances in device physics across optical, electrical, and magnetic modalities have been enabled by the ability to fabricate structures with nanoscale precision. There is currently a large variety of top-down nanostructure fabrication methods available, such as electron beam lithography 1 ,

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confidence: 99%

High resolution fabrication of nanostructures using controlled proximity nanostencil lithography

Jain

Aernecke

Liberman

et al. 2014

Applied Physics Letters

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“…As a redeposition flux, this equation leads to material gain at the node. The model used in TopSim has been shown to predict redeposition in agreement with experimental data [8] as well as the characteristic micro-trenches that evolve in the corners of deep trenches [9].…”

Section: Topography Simulationmentioning

confidence: 55%

“…Realizing these advantages is difficult as the effective local milling rate depends both on the local incidence angle and non-local effects such as redeposition [6] and reflection of incident ions. Simulation is therefore used to predict the response of the target to spatial dose distributions [7][8][9][10]. Furthermore it is desirable not only to predict the outcome of a specific experiment, but also to generate a spatial dose distribution that results in an arbitrarily chosen target topography through the process of inverse modeling.…”

Section: Introductionmentioning

confidence: 99%

Inverse modeling of FIB milling by dose profile optimization

Lindsey

Waid

Hobler

et al. 2014

Nuclear Instruments and Methods in Physics Research Section B:

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“…While redeposition has been investigated in detail in the field of focused ion-beam milling [44][45][46][47][48], its impact on the self-organized pattern formation during ion-beam erosion has been controversially discussed: Anspach and Linz concluded based on the results of a discrete solid-onsolid model that redeposition shares substantial properties with the damping term [49]. For a more exact model, however, one has to incorporate higher order terms, in particular a quadratic damping term c(H −H) 2 , and the coefficients depend on the aspect ratio of the morphology [50].…”

Section: Introductionmentioning

confidence: 99%

Continuum modeling of particle redeposition during ion-beam erosion

Diddens

Linz

2015

Eur. Phys. J. B

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Abstract. We thoroughly investigate the impact of redeposition on the self-organized pattern formation during ion-beam erosion within the framework of a spatially two-dimensional continuum model. An analysis on prestructured patterns allows the extraction of general properties of this mechanism, the typical distribution of redepositing particles and approximations in terms of the surface height in particular. By combining the redeposition model with erosion models, we present detailed results about the impact of redeposition on spatio-temporal surface evolutions. It is shown that redeposition can play a decisive role for pattern formation under ion-beam erosion within an extended range in the parameter space.

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The significance of redeposition and backscattering in nanostructure formation by focused ion beams

Cited by 18 publications

References 17 publications

High resolution fabrication of nanostructures using controlled proximity nanostencil lithography

High resolution fabrication of nanostructures using controlled proximity nanostencil lithography

Inverse modeling of FIB milling by dose profile optimization

Continuum modeling of particle redeposition during ion-beam erosion

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