Inverse modeling of FIB milling by dose profile optimization

Lindsey, S.; Waid, Simon; Hobler, G.; Wanzenböck, Heinz D.; Bertagnolli, E.

doi:10.1016/j.nimb.2014.09.006

Cited by 9 publications

(5 citation statements)

References 25 publications

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“…In addition to the direct flux of incident ions , a number of indirect fluxes significantly influences the evolution of the surface [ 30 ]. In the following description, we consider the flux of redeposited atoms and fluxes due to backscattering of incident ions.…”

Section: Resultsmentioning

confidence: 99%

Level set simulation of focused ion beam sputtering of a multilayer substrate

Rumyantsev,

Borgardt,

Volkov

et al. 2024

Beilstein J. Nanotechnol.

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The evolution of a multilayer sample surface during focused ion beam processing was simulated using the level set method and experimentally studied by milling a silicon dioxide layer covering a crystalline silicon substrate. The simulation took into account the redeposition of atoms simultaneously sputtered from both layers of the sample as well as the influence of backscattered ions on the milling process. Monte Carlo simulations were applied to produce tabulated data on the angular distributions of sputtered atoms and backscattered ions.Two sets of test structures including narrow trenches and rectangular boxes with different aspect ratios were experimentally prepared, and their cross sections were visualized in scanning transmission electron microscopy images. The superimposition of the calculated structure profiles onto the images showed a satisfactory agreement between simulation and experimental results. In the case of boxes that were prepared with an asymmetric cross section, the simulation can accurately predict the depth and shape of the structures, but there is some inaccuracy in reproducing the form of the left sidewall of the structure with a large amount of the redeposited material.To further validate the developed simulation approach and gain a better understanding of the sputtering process, the distribution of oxygen atoms in the redeposited layer derived from the numerical data was compared with the corresponding elemental map acquired by energy-dispersive X-ray microanalysis.

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Section: Resultsmentioning

confidence: 99%

Level set simulation of focused ion beam sputtering of a multilayer substrate

Rumyantsev,

Borgardt,

Volkov

et al. 2024

Beilstein J. Nanotechnol.

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“…During RIE, the physical ion milling is well known to lead to the erosion of atoms from the material, but also the redeposition of sputtered atoms [40]. The sputter-eroded gold may redeposit on the sample again, as described in [41,42]: forward scattering from the sidewalls of the gold hard mask may redeposit in etch trenches and backscattering of the sputtered gold via collision with gas atoms in the plasma will redeposit small amounts of gold on more remote sample surfaces. The material redeposition during ion milling has been extensively studied and simulated [43], especially for focused ion beam milling [44] and for RIE [45].…”

Section: Nanoimprint Master Fabricationmentioning

confidence: 99%

Nanoimprinted Hierarchical Micro-/Nanostructured Substrates for the Growth of Cardiomyocyte Fibers

Mühlberger,

Kopp,

Deyett

et al. 2023

Nanomanufacturing

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Investigating the behavior of cardiomyocytes is an important part of drug development. We present a structure and a related nanoimprint-based fabrication method, where the cardiomyocytes form isolated fibers, which is beneficial for drug testing, more closely representing the structure of the cardiomyocytes in vivo. We found that channel structures with walls with a rough top surface stimulate cardiomyocytes to form such fibers, as desired. Nanoimprint lithography is used as a fast and cost-efficient method to fabricate our hierarchically structured cell growth substrates.

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“…The ion beam-induced physical sputtering does not cause a complete material removal. Instead, the material is locally redistributed [ 15 ]. The phenomenon is known as redeposition and can be minimized by varying the slow beam direction [ 17 ], that is, for line-by-line scanning, by starting from the first line in the first repeat and from the last line in the second repeat.…”

Section: The Fib-o-mat Toolboxmentioning

confidence: 99%

“…This is a great benefit over the manufacturer-specific patterning options that allow for grey-scale patterning, where the grey values encode local doses. The results of the patterning can be improved through modeling of the relevant processes in FIB machining, especially angle-dependent physical sputtering [ 11 ] and redeposition [ 15 ], or geometric considerations [ 12 ]. In the same manner, locally varying doses in He ion-based resist patterning may be corrected based on heuristic modeling employing a point spread function that sums up all physical and chemical processes in resist activation [ 16 ].…”

Section: Introductionmentioning

confidence: 99%

The patterning toolbox FIB-o-mat: Exploiting the full potential of focused helium ions for nanofabrication

Deinhart¹,

Kern²,

Kirchhof³

et al. 2021

Beilstein J. Nanotechnol.

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Focused beams of helium ions are a powerful tool for high-fidelity machining with spatial precision below 5 nm. Achieving such a high patterning precision over large areas and for different materials in a reproducible manner, however, is not trivial. Here, we introduce the Python toolbox FIB-o-mat for automated pattern creation and optimization, providing full flexibility to accomplish demanding patterning tasks. FIB-o-mat offers high-level pattern creation, enabling high-fidelity large-area patterning and systematic variations in geometry and raster settings. It also offers low-level beam path creation, providing full control over the beam movement and including sophisticated optimization tools. Three applications showcasing the potential of He ion beam nanofabrication for two-dimensional material systems and devices using FIB-o-mat are presented.

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Inverse modeling of FIB milling by dose profile optimization

Cited by 9 publications

References 25 publications

Level set simulation of focused ion beam sputtering of a multilayer substrate

Level set simulation of focused ion beam sputtering of a multilayer substrate

Nanoimprinted Hierarchical Micro-/Nanostructured Substrates for the Growth of Cardiomyocyte Fibers

The patterning toolbox FIB-o-mat: Exploiting the full potential of focused helium ions for nanofabrication

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