2009
DOI: 10.1016/j.actamat.2008.11.023
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The relationship between thin film fragmentation and buckle formation: Synchrotron-based in situ studies and two-dimensional stress analysis

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Cited by 116 publications
(67 citation statements)
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“…As described in chapter 2.4.1, random micro fracture of thin and flat metal films on elastomeric substrates is typically applied to fabricate highly compliant interconnects for stretchable electronic platforms 102,141,211 . There are also fundamental investigations of periodic microcrack formation in thin metal films on polymeric substrates 137,138,212,213 . However, a pre-determination of crack formation to obtain highly stretchable meander-like patterns was not obtained so far.…”
Section: Microcrack Formation Mechanismmentioning
confidence: 99%
“…As described in chapter 2.4.1, random micro fracture of thin and flat metal films on elastomeric substrates is typically applied to fabricate highly compliant interconnects for stretchable electronic platforms 102,141,211 . There are also fundamental investigations of periodic microcrack formation in thin metal films on polymeric substrates 137,138,212,213 . However, a pre-determination of crack formation to obtain highly stretchable meander-like patterns was not obtained so far.…”
Section: Microcrack Formation Mechanismmentioning
confidence: 99%
“…As it has been shown by many research groups Frank et al, 2009;Marx et al, 2015b), in situ XRD tensile straining can provide useful information on how thin film or coating thickness, microstructure, and deposition methods influence mechanical stresses and strains of flexible electronic materials. From the evolution of the lattice strains during straining, clear ductile or brittle material behavior is determined.…”
Section: Methodsmentioning
confidence: 99%
“…[22,23] In our tests, deflection is currently restricted within a very small range. Assumed that the segmented coating mainly undertakes tensile stress, [24] as illustrated in Fig.…”
Section: Evaluation Of Interface Fracture Toughnessmentioning
confidence: 99%