“…While conventional chemical vapour deposition, sputtering deposition, ion plating and ion implantation processes have made important contributions to improving corrosion and wear resistance, each of these procedures is inherently limited in its surface modification capabilities. The IBAD method, however, is extremely reliable because of the high degree of in situ control associated with ion energy, deposition rate, thickness and composition, and achieves excellent adhesion to metal surfaces without requiring excessively high temperature (2, 3). Our previous study suggested that VHN value with a load of 3 g for 5 s reaches a plateau when TiN film thickness is 2 μ m or more (5).…”