The preparation and characterization of optical thin films produced by ion-assisted deposition

Abstract

Inert and reactive gas ion beams have been used in the preparation of high-quality optical thin films for use as dielectric coatings on optical components, solar selective absorbers, and protective films on Ag and Al mirrors. Films are deposited by electron-beam evaporation and simultaneous irradiation of the growing film at the substrate or by ion-beam sputtering with and without ion assistance. Substantial improvement in the film packing density has been achieved, the refractive indices increased, and water penetration through the films was suppressed. TiN has been deposited by Ti evaporation and nitrogen irradiation for use as an element in a high-temperature solar selective absorber. Amorphous hydrogenated silicon (a-Si:H) has also been produced by Si evaporation and hydrogen irradiation or by mixed ion-beam sputtering. Significant changes in the crystal structure of PbS have also been achieved by ion irradiation. Dielectric films of ZrO2, SiO2, and Al2O3 have been deposited by ion-assisted deposition and ZrO2 has been used as a highly successful protective coating on Al and Ag mirrors. The optical properties of the films have been studied and the film composition checked by x-ray diffraction, nuclear reaction analysis (NRA), Rutherford backscattering (RBS), x-ray photoelectron spectroscopy (XPS), and ion scattering spectroscopy (ISS).

First-principles study of rare gas incorporation in titanium nitride

“…[1][2][3][4] TiN could also be used as material for solar control coatings in architecture, renewable energy, and automotive glass. [5][6][7][8][9][10] TiN is a hard refractory material with rocksalt structure. Its hardness, near that of diamond, has led to several applications in wear-resistant coating as cutting tools [11][12][13] and superhard material.…”

Thermal oxidation properties of titanium nitride and titanium–aluminum nitride materials — A perspective for high temperature air-stable solar selective absorber applications

“…Titanium nitride (TiN) was first proposed for use as an element in high temperature air-stable solar selective absorbers in 1984 [1]. TiAlN was also recently suggested for applications in solar selective absorbers and solar control windows [2].…”

Plasma-assisted elaboration of macropore architectures in titanium nitride

“…In addition, desirable functional applications of TiN have been realized. The combined properties of excellent conductivity, inertness, and good optical reflectivity at long wavelengths make it a potential IR-reflective back contact material and a solar energy absorber suitable for solar cells [9,10]. TiN is not cytotoxic and may be used in biomedical materials owing to its bio-compatibility, wettability and hydrophilicity [11].…”

“…Conventionally, the preparation of TiN thin films and coatings involves either a physical vapor deposition (PVD) or a chemical vapor deposition (CVD) process [9,13,14]. As to the syntheses of TiN powders and ceramics, the methods usually fall into the categories of solid state metathesis (SSM) reactions [15], combustion synthesis [16], nitridation of titanium metal or its halides, hydrides and oxides [17][18][19][20], etc.…”