The porous silicon emitter concept applied to multicrystalline silicon solar cells

Strehlke, S; Sarti, D.; Krotkus, A.; Grigoras, K.; Lévy‐Clément, C.

doi:10.1016/s0040-6090(96)09368-6

Cited by 53 publications

(25 citation statements)

References 2 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Actually, a porous silicon coating reduces the reflectance and improves the light absorbance in the useful photovoltaic spectral range. Indeed, the effectiveness of the porous layer as the anti reflecting coating of the solar cell is already confirmed (Strehle et al 1997). In tandem solar cell structure the use of micro porous silicon as an active element on a non degenerate p-type crystalline silicon has been reported.…”

Section: Porous Silicon Solar Cellmentioning

confidence: 90%

Nanocrystalline Porous Silicon

Basu¹,

Kanungo²

2011

Crystalline Silicon - Properties and Uses

View full text Add to dashboard Cite

Section: Porous Silicon Solar Cellmentioning

confidence: 90%

Nanocrystalline Porous Silicon

Basu¹,

Kanungo²

2011

Crystalline Silicon - Properties and Uses

View full text Add to dashboard Cite

“…The difference in reflectivity between porous silicon and bulk Si is primarily due to a significant reduction of the refractive index of the porous silicon (n PS ). n PS can be controlled in a wide range between 1.3 and 3, by varying the porosity which in turn can be controlled by the current density applied during porous silicon electrochemical formation [26][27][28]. This property was widely used to build porous silicon antireflective layers.…”

Section: Photoelectrochemical Processing Of Semiconductors For Solar mentioning

confidence: 99%

“…It was shown that a porous silicon layer could efficiently replace the classical antireflective coating treatments used in the multicrystalline silicon solar cell industry. Implementation of a porous silicon layer at the outermost part of the emitter allows to reduce the number of steps in the solar cells processing and decrease their cost of fabrication [26,29].…”

Section: Photoelectrochemical Processing Of Semiconductors For Solar mentioning

confidence: 99%

(Research Award of the Energy and Technology Division) (Photo)Electrochemistry in the Service of Solar Energy Conversion

Lévy‐Clément

2011

ECS Trans.

View full text Add to dashboard Cite

The paper is a short summary of the lecture delivered for the 2011 Research Award of the Energy Technology Division. The main expertise field of my group is materials science and (photo)electrochemistry for energy conversion and storage. The motivations that oriented my research are described, spanning from photoelectrochemistry of single crystal semiconductors, p-n photoelectroelectrochemical cells for solar hydrogen generation, to the photoetching of semiconductors, electrochemical processing of silicon surface including porous silicon, electrodeposition of polycrystalline semiconductor thin films and monocrystalline nanowires and development of Eta (extremely thin absorber) solar cells.

show abstract

“…The porous layer formed by electrochemical etching consists of interconnected nanocrystalline features with sizes around 1 -10 nm [74]. Thereby, it can be explained that this layer more or less acts as an antireflection coating with an effective refractive index [75]. For these very small feature sizes no significant scattering or diffraction for relevant wavelengths can be expected.…”

Section: Alternative Techniques For Maskless Texturing Processesmentioning

confidence: 99%

Nanoimprint lithography for solar cell texturisation

et al. 2010

View full text Add to dashboard Cite

The highest efficiency silicon solar cells are fabricated using defined texturing schemes by applying etching masks. However, for an industrial production of solar cells the usage of photolithographic processes to pattern these etching masks is too consumptive. Especially for multicrystalline silicon, there is a huge difference in the quality of the texture realized in high efficiency laboratory scale and maskless industrial scale fabrication. In this work we are describing the topography of a desired texture for solar cell front surfaces. We are investigating UV-nanoimprint lithography (UV-NIL) as a potential technology to substitute photolithography and so to enable the benefits resulting of a defined texture in industrially feasible processes. Besides the reduced process complexity, UV-NIL offers new possibilities in terms of structure shape and resolution of the generated etching mask. As mastering technology for the stamps we need in the UV-NIL, interference lithography is used. The UV-NIL process is conducted using flexible UV-transparent stamps to allow a full wafer process. The following texturisation process is realized via crystal orientation independent plasma etching to tap the full potential of the presented process chain especially for multicrystalline silicon. The textured surfaces are characerised optically using fourier spectroscopy

show abstract

The porous silicon emitter concept applied to multicrystalline silicon solar cells

Cited by 53 publications

References 2 publications

Nanocrystalline Porous Silicon

Nanocrystalline Porous Silicon

(Research Award of the Energy and Technology Division) (Photo)Electrochemistry in the Service of Solar Energy Conversion

Nanoimprint lithography for solar cell texturisation

Contact Info

Product

Resources

About