The Photogalvanic Disruption of Cuprous Oxide Films on Copper

Abstract

The cuprous oxide film normally present on copper is disrupted by photogalvanic action. Partial illumination of an oxidized copper surface in an electrolyte results in reduction of the cuprous oxide to metallic copper in the illuminated areas and oxidation and dissolution of the cuprous oxide in the unilluminated areas. The disrupted film is believed to lead to an observed increase in corrosion rate of copper in an illuminated salt‐spray cabinet.

Reaction of amines with haloalkanes. 5. Dissolution of copper activated by sulfur in butylamine-carbon tetrachloride solutions

“…Other workers have noted the importance of films in copper dissolution reactions. [4][5][6] In this work several observations indicate that film formation plays a major role in the reaction of the copper. These observations are related to the induction period, the effect of light, and the independence of rate on the concentrations of reactants.…”