2009
DOI: 10.1016/j.susc.2008.11.030
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The path to stoichiometric composition of III–V binary quantum dots through plasma/ion-assisted self-assembly

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Cited by 9 publications
(5 citation statements)
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“…27 Furthermore, it is also worth to mention that there are reports on the growth of graded Si 1Àx C x , InSb and GaAs QDs via the plasma-assisted nano-assembly. [30][31][32][33] In these studies, it was shown that the grading of elemental composition in the QDs can be controlled systematically. Interestingly, the plasma-assisted growth mechanism has been successfully implemented experimentally to synthesize the Si 1Àx C x QD arrays 34 and iron oxide nanostructures.…”
Section: Analysis I: CD 1àx Zn X Se/znsementioning
confidence: 99%
“…27 Furthermore, it is also worth to mention that there are reports on the growth of graded Si 1Àx C x , InSb and GaAs QDs via the plasma-assisted nano-assembly. [30][31][32][33] In these studies, it was shown that the grading of elemental composition in the QDs can be controlled systematically. Interestingly, the plasma-assisted growth mechanism has been successfully implemented experimentally to synthesize the Si 1Àx C x QD arrays 34 and iron oxide nanostructures.…”
Section: Analysis I: CD 1àx Zn X Se/znsementioning
confidence: 99%
“…Gaseous plasmas represent an ideal fabrication environment for this purpose. A high degree of compositional control during nanoassembly has been demonstrated for plasma-based processes both computationally [113,116,134,135] and experimentally [136][137][138][139][140][141].…”
Section: Tailoring Metal Nanoarraysmentioning
confidence: 99%
“…Initially, the quantum dots were used in microelectronics and optoelectronic materials [1,2] , then quantum dots were applied in biological and medical aspects [3,4] due to their visible area unique and excellent fluorescence properties. With the deepening research of quantum dots, quantum dots have been extended to quantitative analysis of heavy metal ions, small organic molecules and drugs [5,6] .…”
Section: Introductionmentioning
confidence: 99%