The outside vapor deposition method of fabricating optical waveguide fibers

Étude des processus photochimiques primaires dans les fibres optiques germanosilicates lors d'une insolation ultraviolette

“…Ces fibres commerciales ont des origines différentes et sont fabriquées selon les méthodes MCVD [9] (0, 13, 17 mol%), et OVD [10] (4 mol%). Ce sont toutes des fibres optiquesà faible diamètre de coeur (<10 m).…”

Experimental Study of SiO2Soot Deposition using the Outside Vapor Deposition Method

“…Several deposition methods have been proposed since the 1970s with the aim to fabricate high purity silica glass for the realization of optical fibers: the Vapor Axial Deposition process (VAD) (Izawa 2000), the Modified Chemical Vapor Deposition (MCVD) (Nagel et al 1982), the Plasma-activated Chemical Vapor Deposition (PCVD), and the Outside Vapor Deposition (OVD) (Blankenship and Deneka 1982), which are respectively attributed to the NTT labs, the Bell labs, Philips GmbH and Corning Incorporated. Those precursory methods have then been improved and extended to various versions such as the Surface Plasma Chemical Deposition (SPCVD) (Pavy et al 1986) and the Plasma Outside Vapor Deposition (POVD) methods (Vandewoestine and Morrow 1986).…”

Magnetohydrodynamic modeling for an OVD reactor setup

“…Deposition is one of the most widely used technologies that make use of the plasma as a high-temperature energy source and a source of chemically active species involved in the plasma processing. In particular, ICP torches are applied in manufacturing of preforms for optical fibers making use of the process of Outside Vapor Deposition (OVD) [2,3]. The ICP torch is employed as a high-temperature source for melting silica grains and further deposition and solidification of pure silica [4] or as a source of chemical reactants (e. g. from SiCl 4 and O 2 ) for building SiO 2 and hence for the direct deposition of vitreous high-purity silica layers on a preform substrate [6].…”

“…In this work, we present a comprehensive three-dimensional model of an ICP torch being coupled to the outside vapor deposition (OVD) of vitreous SiO 2 on a moving substrate. This kind of production technique is currently used in manufacturing of preforms for optical fibers [3,7,8] together with other methods such as modified chemical vapor deposition (MCVD), vapor axial deposition (VAD), and plasma chemical vapor deposition (PCVD) [18]. The goal of the model developed is to allow a self-consistent description of the interplay between an inductively coupled plasma source and a concrete plasma deposition process to which the plasma source is applied.…”