2011
DOI: 10.1016/j.precisioneng.2011.04.004
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The NANOMEFOS non-contact measurement machine for freeform optics

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Cited by 94 publications
(63 citation statements)
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References 9 publications
(13 reference statements)
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“…err., generated errors. guiding systems [31,33]. The generated PV value of the Fourier harmonics (≈609 nm) corresponds to a realistic form error on aspherical lenses…”
Section: Combined Random and Systematic Errorsmentioning
confidence: 96%
“…err., generated errors. guiding systems [31,33]. The generated PV value of the Fourier harmonics (≈609 nm) corresponds to a realistic form error on aspherical lenses…”
Section: Combined Random and Systematic Errorsmentioning
confidence: 96%
“…Specifically for freeform measurement we have developed a unique absolute metrology tool called NANOMEFOS that has the capability of noncontact measuring surfaces with an uncertainty better than 15 nm rms [5]. It is fast, universal, and can accommodate large work pieces.…”
Section: B Measurementmentioning
confidence: 99%
“…The asphere was polished from 5µm PV to 24 nm rms in 6 runs. Figure 6 shows the final result as measured with the NANOMEFOS measurement machine [5]. This non-contact measurement machine typically obtains 2k x 2k points in about 15 minutes, giving interferometric resolution with nm level accuracy (Figure 7).…”
Section: L2 Fabricationmentioning
confidence: 99%