1993
DOI: 10.1016/0022-3093(93)90479-h
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The mott lecture. Structural and electronic properties of amorphous SiGe:H alloys

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Cited by 34 publications
(9 citation statements)
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“…a-Si photovoltaic technology has since advanced by taking advantage of a range of band gaps accessible through alloying with germanium or carbon 4,5 . Alloying of a-Si has led to multi-junction solar cells with somewhat higher efficiencies, but it also causes reduced electrical performance due to higher defect densities 6,7 . The poor conductivity and the limited bandgap range of a-Si alloys severely hinder the widespread applications of a-Si alloys despite their potential advantages of lower cost and ability to deposit on flexible substrates.…”
Section: Introductionmentioning
confidence: 99%
“…a-Si photovoltaic technology has since advanced by taking advantage of a range of band gaps accessible through alloying with germanium or carbon 4,5 . Alloying of a-Si has led to multi-junction solar cells with somewhat higher efficiencies, but it also causes reduced electrical performance due to higher defect densities 6,7 . The poor conductivity and the limited bandgap range of a-Si alloys severely hinder the widespread applications of a-Si alloys despite their potential advantages of lower cost and ability to deposit on flexible substrates.…”
Section: Introductionmentioning
confidence: 99%
“…A recent review discusses the universally observed problem of the degradation of opto-elecronic properties of a-Si I,,Ge,:H with increasing x [42]. As previously documented [16], Ge alloying above a fraction of about x d .…”
Section: Low-bandgap Alloys (A-sige:h)mentioning
confidence: 90%
“…21, indicating an exponential increase, by roughly a factor of 300 overall, as x varies from 0 to 1. [29,38,39] Figures 20 and 21 indicate that the 3 series of a-Si,Ge:H samples that my group has investigated (from U. Delaware, Harvard, and Uni-Solar) come very close to being optimized in the sense that they exhibit Urbach tail energies as low as high quality a-Si:H and also quite low deep defect levels overall. One additional indicator that these a-Si,Ge:H alloy samples are optimized is the degree to which they obey the spontaneous bond breaking model of M.…”
Section: Defect Densities In the Amorphous Silicon-germanium Alloysmentioning
confidence: 98%