1999
DOI: 10.1109/4.782089
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The mirrored lateral SCR (MILSCR) as an ESD protection structure: design and optimization using 2-D device simulation

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Cited by 7 publications
(3 citation statements)
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“…Failure analysis carried out using the focus ion beam (FIB) technique confirmed that failure actually occurs deep below the emitter, at a location where the 2-D simulation showed both high current density and high electric field [13].…”
Section: Analysis Of Physical Mechanisms Involved Under An Esd Smentioning
confidence: 98%
“…Failure analysis carried out using the focus ion beam (FIB) technique confirmed that failure actually occurs deep below the emitter, at a location where the 2-D simulation showed both high current density and high electric field [13].…”
Section: Analysis Of Physical Mechanisms Involved Under An Esd Smentioning
confidence: 98%
“…The MILSCR, which is designed with dual-direction active SCR current paths, comprises two vertical NPN transistors, one vertical PNP transistor, and one lateral PNP transistor in N-epi P-substrate high-voltage CMOS process. The MILSCR was designed for high-voltage applications [49], but its switching voltage can be also adjusted to meet the requirements of the low-voltage CMOS ICs as those of the MLSCR or the LVTSCR. Although the SCR-based devices can elevate the ESD levels of high-voltage CMOS IC products, how to avoid the transient-induced latchup issue [31] of SCR-based devices under normal circuit operating conditions in high-voltage process is another important reliability consideration [50].…”
Section: Scr Devices In Other Applicationsmentioning
confidence: 99%
“…The DENMOS merged with an SCR [46], [47], or the embedded SCR LDMOS (ESCR-LDMOS) [48], had been reported to improve ESD level of high-voltage IC products. Another ESD protection device for high-voltage applications is the mirrored lateral SCR (MILSCR) [49]. The MILSCR, which is designed with dual-direction active SCR current paths, comprises two vertical NPN transistors, one vertical PNP transistor, and one lateral PNP transistor in N-epi P-substrate high-voltage CMOS process.…”
Section: Scr Devices In Other Applicationsmentioning
confidence: 99%