1996
DOI: 10.1557/proc-452-865
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The “Micromorph” Cell: a New Way to High-Efficiency-Low-Temperature Crystalline Silicon Thin-Film Cell Manufacturing?

Abstract: Abstract. Hydrogenated microcrystalline Silicon (µc-Si:H) produced by the VHF-GD (Very High Frequency Glow Discharge) process can be considered to be a new base material for thin-film crystalline silicon solar cells. The most striking feature of such cells, in contrast to conventional amorphous silicon technology, is their stability under lightsoaking. With respect to crystalline silicon technology, their most striking advantage is their low process temperature (220°C). The so called "micromorph" cell contains… Show more

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Cited by 19 publications
(4 citation statements)
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“…[24,25] A strategy to effectively mitigate TCO-related optical losses is the integration of a p/n recombination junction as widely used in III-V semiconductor and thin-film silicon tandem solar cells. [27,30] By adding either trimethylboron or phosphine to the silane/hydrogen mixture in the reactor, highly doped nc-Si:H can be obtained, [31] which is required for recombination junctions exhibiting low resistance and narrow-potential energy barrier widths. [29] A particularly interesting low-temperature (<200 °C) approach lies in using hydrogenated nanocrystalline silicon (nc-Si:H), deposited by plasma-enhanced chemical vapor deposition (PECVD) employing silane gas with high hydrogen dilution.…”
Section: Introductionmentioning
confidence: 99%
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“…[24,25] A strategy to effectively mitigate TCO-related optical losses is the integration of a p/n recombination junction as widely used in III-V semiconductor and thin-film silicon tandem solar cells. [27,30] By adding either trimethylboron or phosphine to the silane/hydrogen mixture in the reactor, highly doped nc-Si:H can be obtained, [31] which is required for recombination junctions exhibiting low resistance and narrow-potential energy barrier widths. [29] A particularly interesting low-temperature (<200 °C) approach lies in using hydrogenated nanocrystalline silicon (nc-Si:H), deposited by plasma-enhanced chemical vapor deposition (PECVD) employing silane gas with high hydrogen dilution.…”
Section: Introductionmentioning
confidence: 99%
“…A first demonstration of a silicon‐based recombination junction for perovskite/silicon tandem cells was made by Mailoa et al, on a diffused‐junction c‐Si solar cell, although with a limited efficiency of 13.7% and requiring a high‐temperature annealing step that is not compatible with SHJ cells . A particularly interesting low‐temperature (<200 °C) approach lies in using hydrogenated nanocrystalline silicon (nc‐Si:H), deposited by plasma‐enhanced chemical vapor deposition (PECVD) employing silane gas with high hydrogen dilution . By adding either trimethylboron or phosphine to the silane/hydrogen mixture in the reactor, highly doped nc‐Si:H can be obtained, which is required for recombination junctions exhibiting low resistance and narrow‐potential energy barrier widths.…”
Section: Introductionmentioning
confidence: 99%
“…Indeed, the deposition rate of p c-Si:H became faster in recent days [33]. However, taking things simply, Rd should be at least 10 times faster than a-SiGe:H in order to fabricate its thicker photovoltaic layer in mass production.…”
Section: Productivitymentioning
confidence: 99%
“…Hydrogenated amorphous (a‐Si:H) and microcrystalline ( μ c‐Si:H) silicon are well suited for combination in a tandem solar cell . An essential requirement for high efficiency is a good current matching as the cell with lower current limits the whole device.…”
Section: Introductionmentioning
confidence: 99%