The micro-imaging station of the TopoTomo beamline at the ANKA synchrotron light source

Rack, Alexander; Weitkamp, Timm; Trabelsi, S. Bauer; Modregger, Peter; Cecilia, A.; Rolo, Tomy dos Santos; Rack, T.; Haas, David J.; Simon, R.; Heldele, Richard; Schülz, Michael; Mayzel, Boaz; Danilewsky, A.N.; Waterstradt, T.; Diete, W.; Riesemeier, H.; Müller, Bernd R.; Baumbach, Tilo

doi:10.1016/j.nimb.2009.04.002

Cited by 95 publications

(59 citation statements)

References 65 publications

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“…We would like to mention that Pd/B 4 C, which has not been reported before as having been used as a monochromator for hard x-ray microimaging, is now used as part of a double-multilayer monochromator at the bending-magnet beamline TopoTomo of the ANKA synchrotron light source in Karlsruhe (Germany) [16][17][18].…”

Section: Discussionmentioning

confidence: 99%

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Performance of Multilayer Monochromators for Hard X-Ray Imaging with Coherent Synchrotron Radiation

Dietsch¹,

Rack²,

Weitkamp³

et al. 2011

AIP Conference Proceedings

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Section: Discussionmentioning

confidence: 99%

“…In detail, the beam profile after reflection as well as the coherence properties of the reflected beam where investigated [15]. The results have already been used in the specifications of a double-multilayer monochromator for the TopoTomo beamline of the ANKA light source (Germany) [16][17][18].…”

Section: Synchrotron Hard X-ray Imaging Performancementioning

confidence: 99%

Performance of Multilayer Monochromators for Hard X-Ray Imaging with Coherent Synchrotron Radiation

Dietsch¹,

Rack²,

Weitkamp³

et al. 2011

AIP Conference Proceedings

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“…Consequently, our group has investigated different multilayers and the corresponding reflected wave fronts at ESRF and different beamlines around the globe. Multilayer mirrors of larger dimension were studied, all of them permanently installed at the ID19 beamline of the European Synchrotron Radiation Facility (ESRF, France) as well as the TopoTomo beamline of the ANKA light source (Germany) 4,10 : The initial studies were basically confirmed, i.e. that parameters such as d-spacing and the number of bilayers grown have negligible influence on the wave front preservation properties.…”

Section: Introductionmentioning

confidence: 94%

“…Hence, especially at synchrotron light sources more and more multilayer mirrors are used for monochromatization due to their larger spectral bandpass with respect to crystal-based devices when, for example, microtomography is performed 1,2 . Double-multilayer monochromators are commercially available, including the mirrors and in-vacuum mechanics [3][4][5] . Despite the increasing demand for wave front-preserving multilayer mirrors, little is known about how the reflection from such a mirror affects the wave front in terms of homogeneity and coherence properties 6 .…”

Section: Introductionmentioning

confidence: 99%

Reflection on multilayer mirrors: beam profile and coherence properties

et al. 2014

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The main advantage of Bragg reflection from a multilayer mirror as a monochromator for hard X-rays, is the higher photon flux density because of the larger spectral bandpass compared with crystal lattice reflection. The main disadvantage lies in the strong modulations of the reflected beam profile. This is a major issue for micro-imaging applications, where multilayer-based monochromators are frequently employed to deliver high photon flux density. A subject of particular interest is the origin of the beam profile modifications, namely the irregular stripe patterns, induced by the reflection on a multilayer. For multilayer coatings in general it is known that the substrate and its surface quality significantly influence the performance of mirrors, as the coating reproduces to a certain degree the roughness and shape of the substrate. This proceedings article reviews recent experiments that indicate potential options for producing wave front-preserving multilayer mirrors, as well as new details on the particular mirrors our group has extensively studied in the past.

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“…W-based multilayer systems, such as W/Si [8,9] and W/B 4 C [10,11] , are fabricated to produce ordinary monochromators with a spectral resolution of 1%-2%. Meanwhile, Al 2 O 3 /B 4 C [12] , SiC/C [13] , and even C/C [14] can be used for higher resolution.…”

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Small d-spacing WSi2/Si multilayers for X-ray monochromators

Huang

Zhu

et al. 2012

中国光学快报

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A WSi2/Si multilayer, with 300 bi-layers and a 2.18-nm d-spacing, is designed for X-ray monochromator application. The multilayer is deposited using direct current magnetron sputtering technology. The reflectivity of the 1st-order Bragg peak measured at E = 8.05 keV is 38%, and the angular resolution (∆θ/θ) is less than 1.0%. Fitting results of the reflectivity curve indicate a layer thickness drift of 1.6%, mainly accounting for the broadening of the Bragg peaks. The layer morphology is further characterized by transmission electron microscopy, and a well-ordered multilayer structure with sharp interfaces is observed from the substrate to the surface. The material combination of WSi2/Si is a promising candidate for the fabrication of a high-resolution multilayer monochromator in the hard X-ray region.

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The micro-imaging station of the TopoTomo beamline at the ANKA synchrotron light source

Cited by 95 publications

References 65 publications

Performance of Multilayer Monochromators for Hard X-Ray Imaging with Coherent Synchrotron Radiation

Performance of Multilayer Monochromators for Hard X-Ray Imaging with Coherent Synchrotron Radiation

Reflection on multilayer mirrors: beam profile and coherence properties

Small d-spacing WSi2/Si multilayers for X-ray monochromators

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