The Mercury-Photosensitized Decomposition of Acetylene in the Presence of Nitric Oxide

Sherwood, A. G.; Gunning, H. E.

doi:10.1021/j100889a050

Cited by 20 publications

(13 citation statements)

References 5 publications

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“…The products of the cadmium-photosensitization are different from those of the mercuryphotosensitization, [1][2][3][4][5][6][7][8] the direct photolysis,11) and the radiolysis.12)…”

Section: Resultsmentioning

confidence: 99%

The Reactions of Acetylene Photosensitized by Cd(3P1)

Tsunashima

Sato

1968

Bulletin of the Chemical Society of Japan

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The main products were benzene and vinylacetylene. The formations of polymer and hydrogen were not observed. From the studies of the effects of pressures and foreign gases on the quantum yields, the product formations were successfully explained by the reactions of excited molecules. The investigation of the reaction of a mixture of hydrogen and acetylene photosensitized by Cd(3P1) suggests that benzene is also formed from the reactions of hydrogen atoms and acetylene molecules.

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“…The products of the cadmium-photosensitization are different from those of the mercuryphotosensitization, [1][2][3][4][5][6][7][8] the direct photolysis,11) and the radiolysis.12)…”

Section: Resultsmentioning

confidence: 99%

The Reactions of Acetylene Photosensitized by Cd(3P1)

Tsunashima

Sato

1968

Bulletin of the Chemical Society of Japan

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“…However, our calculated heat of The subset involving reactions between the vinyl radical and nitrogen oxides warrants particular attention in the present work. There are a number of studies on the C 2 H 3 + NO reaction [17,[25][26][27][28][29]; several of them focusing on the inhibiting role of NO in the pyrolysis of acetylene [26][27][28]. Recent experimental and theoretical results [17,25] indicate that HCN + CH 2 O (R4) is the only significant product channel near room temperature and at low pressure.…”

Section: Chemical Kinetic Modelmentioning

confidence: 99%

High pressure oxidation of C2H4/NO mixtures

Giménez-López

Alzueta

Rasmussen

et al. 2011

Proceedings of the Combustion Institute

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An experimental and kinetic modeling study of the interaction between C 2 H 4 and NO has been performed under flow reactor conditions in the intermediate temperature range (600-900 K), high pressure (60 bar), and for stoichiometries ranging from reducing to oxidizing conditions. The main reaction pathways of the C 2 H 4 /O 2 /NO x conversion, the capacity of C 2 H 4 to remove NO, and the influence of the presence of NO x on the C 2 H 4 oxidation are analyzed. Compared to the C 2 H 4 /O 2 system, the presence of NO x shifts the onset of reaction 75-150 K to lower temperatures. The mechanism of sensitization involves the reaction HOCH 2 CH 2 OO + NO → CH 2 OH + CH 2 O + NO 2 , which pushes a complex system of partial equilibria towards products. This is a confirmation of the findings of Doughty et al. [Proc. Combust. Inst. 26 (1996) 589-596] for a similar system at atmospheric pressure. Under reducing conditions and temperatures above 700 K, a significant fraction of the NO x is removed. This removal is partly explained by the reaction C 2 H 3 + NO → HCN + CH 2 O. However, a second removal mechanism is active in the 700-850 K range, which is not captured by the chemical kinetic model. With the present thermochemistry and kinetics, neither formation of nitro-hydrocarbons

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“…The reaction of vinyl radical with nitric oxide has been investigated in the context of the mercury-photosensitized decomposition of acetylene/NO mixtures 10 and H-and Clinitiated reactions of acetylene with NO. 11 These experiments indicated that the reaction of vinyl radicals with NO produces HCN þ CH 2 O at room temperature.…”

Section: Introductionmentioning

confidence: 99%