2016
DOI: 10.1016/j.ceramint.2015.10.126
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The investigation of dielectric properties and ac conductivity of Au/GO-doped PrBaCoO nanoceramic/n-Si capacitors using impedance spectroscopy method

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Cited by 70 publications
(34 citation statements)
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“…The relation between permittivity and electric modulus is that the latter is reciprocal of the former, i.e. M*=1/ε* [1,2, 3,5,7,8], therefore real and imaginary parts of electric modulus are calculated using the following equation; It is seen that σac-f plots increase gradually up to 0.1 MHz, then they increase rapidly. The increase in σac with increasing frequency leads to an increase in eddy current and this is consistent with the decreasing strength of series resistance with frequency ( Figure 2 Figure 7 (b) shows σac-dσac/dlnω plot whose yintercept corresponds to σdc.…”
Section: Resultsmentioning
confidence: 99%
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“…The relation between permittivity and electric modulus is that the latter is reciprocal of the former, i.e. M*=1/ε* [1,2, 3,5,7,8], therefore real and imaginary parts of electric modulus are calculated using the following equation; It is seen that σac-f plots increase gradually up to 0.1 MHz, then they increase rapidly. The increase in σac with increasing frequency leads to an increase in eddy current and this is consistent with the decreasing strength of series resistance with frequency ( Figure 2 Figure 7 (b) shows σac-dσac/dlnω plot whose yintercept corresponds to σdc.…”
Section: Resultsmentioning
confidence: 99%
“…Therefore, there has been a great effort for enhancing the performance metal-semiconductor (MS) structures by using interfacial materials with high dielectric constant such as TiO2 [1-3] Bi3Ti4O12 (BTO) [4,5], BaTiO3 [6], (graphene-oxide-doped PrBaCoO nanoceramics) [7], (7% graphene doped-PVA) [8] and (Al2O3/Ga2O3(Gd2O3)) [9]. Among these various interlayer materials, ferroelectrics come forward since not only it provides high dielectric constant but also it is suitable for photodiode and non-volatile memory applications [10].…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, studies on interface properties are essential in the understanding of the electrical and dielectric properties of the MIS structures, and are especially of the technological importance for development of GaAs-based devices [8][9][10]. The interfacial parameters, such as the density of interface states N ss and the thickness of interfacial layer, can influence both the electrical and dielectric behavior of these structures [11][12][13][14][15][16]. It is known that when localized states exist at the interface, the device behavior is different from the ideal case.…”
Section: Introductionmentioning
confidence: 99%
“…Al 2 O 3 is an attractive candidate for the high-k material. It has a wide band gap of about 6.6 eV and dielectric constant of 8.6 (for the amorphous oxide, typical for layers grown by atomic layer deposition (ALD)) [1][2][3][4][5][6][7][8][9][10][11].…”
Section: Introductionmentioning
confidence: 99%
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