2014
DOI: 10.1016/j.solmat.2013.04.026
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The interface of a-SiNx:H and Si: Linking the nano-scale structure to passivation quality

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Cited by 8 publications
(6 citation statements)
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“…If the defect density is high, the fixed charge density will be high, but more recombination centers will be present as well. These results are exactly in line with recent experimental studies [10,19]. Based on our present results, we suppose that it will be hard to achieve a negative, fixed charge by using the standard a-SiN:H passivation.…”
Section: Discussionsupporting
confidence: 93%
See 1 more Smart Citation
“…If the defect density is high, the fixed charge density will be high, but more recombination centers will be present as well. These results are exactly in line with recent experimental studies [10,19]. Based on our present results, we suppose that it will be hard to achieve a negative, fixed charge by using the standard a-SiN:H passivation.…”
Section: Discussionsupporting
confidence: 93%
“…For this reason, several authors recently examined c-Si/a-SiN:H interfaces by using computer simulations [13][14][15][16][17][18][19][20]. For example, Butler et al performed a topological analysis and compared the density of structural defects for different thicknesses of the transition region between c-Si and a-SiN:H [15,16].…”
mentioning
confidence: 99%
“…The publications of Lamers et al [1,2] on SiN x :H passivation indicate the interface between dielectric and silicon bulk to be the crucial location for surface passivation quality.…”
Section: Introductionmentioning
confidence: 99%
“…[ 29 ] The additional nitridation step is a plasma treatment process that causes atomically distorted interfaces. [ 107,108 ] Atomic‐scale Si‐rich thin layers are known to be formed in the immediate vicinity of the distorted interface, which might cause a higher electric conductivity. This combination can be shown to reduce polarization‐type PID effectively.…”
Section: Polarization‐type Pidmentioning
confidence: 99%