2021
DOI: 10.1039/d1na00181g
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The interaction of size-selected Ru3 clusters with RF-deposited TiO2: probing Ru–CO binding sites with CO-temperature programmed desorption

Abstract: A loss of Ru–CO sites on the clusters suggests encapsulation.

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Cited by 6 publications
(17 citation statements)
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References 112 publications
(229 reference statements)
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“…An HHV/Edwards TF500 Sputter Coater was used at a pressure of <2 x 10 -5 mbar. This process has been described in detail in previous publications [30,58]. Based on SEM measurements performed on previously prepared wafers, the thickness of the RF-TiO2 was approximately 150 nm [58], which is thick enough that the SiO2 wafer beneath would not affect any measured electron spectra.…”
Section: Methodology Substratesmentioning
confidence: 99%
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“…An HHV/Edwards TF500 Sputter Coater was used at a pressure of <2 x 10 -5 mbar. This process has been described in detail in previous publications [30,58]. Based on SEM measurements performed on previously prepared wafers, the thickness of the RF-TiO2 was approximately 150 nm [58], which is thick enough that the SiO2 wafer beneath would not affect any measured electron spectra.…”
Section: Methodology Substratesmentioning
confidence: 99%
“…CVD-deposited samples are referred to as CVD-Ru3(CO)12. At Flinders University, the CVD procedure followed the method described in the Supplementary Material (page 2), which has also been described in previous work [30]. Briefly, Ru3(CO)12 was inserted into a loading chamber and allowed to evaporate/deposit onto samples; 120 minutes for RF-TiO2 and 30 minutes for TiO2 (110).…”
Section: Cluster Depositions Chemical Vapor Depositionmentioning
confidence: 99%
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