1995
DOI: 10.1016/0956-7151(95)00132-f
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The initial stages of the formation of holes and hillocks in thin films under equal biaxial stress

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Cited by 35 publications
(11 citation statements)
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“…28,29 For the case of aluminum, two main growth mechanisms were proposed in literature: intrinsic stress in the film during evaporation 30,31 and formation by postevaporation thermal stress upon annealing. [32][33][34] As the substrates did not suffer elevated temperatures in our experiments, we rule out thermal stress as a possible cause for the observed features.…”
Section: ͑1͒mentioning
confidence: 99%
“…28,29 For the case of aluminum, two main growth mechanisms were proposed in literature: intrinsic stress in the film during evaporation 30,31 and formation by postevaporation thermal stress upon annealing. [32][33][34] As the substrates did not suffer elevated temperatures in our experiments, we rule out thermal stress as a possible cause for the observed features.…”
Section: ͑1͒mentioning
confidence: 99%
“…[5][6][7] Srolovitz and Safran 8,9 have performed both the energetic and kinetic analyses on the evolution of an array of cylindrical holes at the grain boundary vertex. Genin et al 10 have analyzed the kinetics of pit development at a grain boundary vertex.…”
Section: ͑2͒mentioning
confidence: 99%
“…One of the drawbacks of the study of Genin and coworkers [1, 6,7] was the absence of long range surface diffusion into the ridge from the surroundings film area. Kim et al [9] indicated the essence of long range diffusion by citing Chaudhari's [10] ridge model in which an analysis of the lattice diffusion (Nabarro -Herring creep) was presented.…”
Section: Introductionmentioning
confidence: 99%