The influence of surface roughness on electronic transport in thin films

Reiss, Günter; Brückl, Hubert

doi:10.1016/0039-6028(92)91347-e

Cited by 17 publications

(4 citation statements)

References 14 publications

(16 reference statements)

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“…This agrees well with our previous results of in-situ resistance measurements obtained for similar multilayers [8]. In thin film systems there is a good correlation between the initial mesoscopic roughness found by scanning tunneling microscopy and the onset of Ohmic conductivity [12]. This correlation allowed us to estimate the initial roughness of Py deposited on glass at about 1.2 nm.…”

Section: As-deposited Multilayerssupporting

confidence: 81%

Annealing Effects on Py/Cu GMR Multilayer Films with Limited Number of Sublayers

Urbaniak

Stobiecki

Luciński

et al. 2001

phys. stat. sol. (a)

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The influence of annealing on giant magnetoresistance (GMR) effect and magnetization reversal processes has been investigated in Py/Cu (Py = Ni 83 Fe 17 ) sputter-deposited multilayers (MLs) with a limited number of magnetic sublayers (N 6) and equal sublayer thicknesses both for Py and Cu (t Cu = 2 nm, t Py = 2 nm). Based on the magnetization and magnetoresistance measurements it has been shown that the magnetic behavior of such MLs is strongly influenced by annealing driven disruption of magnetic layers (lateral decoupling) and nonmagnetic layers (magnetic bridging between Py layers). A comparison of experimental hysteresis curves with model dependences indicates that annealing causes a change of the magnetization reversal from a local to an absolute energy minimum mode leading to quasi-two-state magnetoresistance characteristics.

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Section: As-deposited Multilayerssupporting

confidence: 81%

Annealing Effects on Py/Cu GMR Multilayer Films with Limited Number of Sublayers

Urbaniak

Stobiecki

Luciński

et al. 2001

phys. stat. sol. (a)

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“…In the case of mesoscopic roughness in the range of a few nanometers, this because of the film's varying thickness, which results in a spatially variable conductivity. Also, microscopic roughness can lead to electrons' dispersion and further improves the thin film's resistance [25].…”

Section: Morphological Studiesmentioning

confidence: 99%

Preparation, Raman spectroscopy, surface morphology and optical properties of TiPcCl2 nanostructured films: thickness effect

et al. 2021

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Phthalocyanines are of a broad interest in photovoltaic applications. In this study, films of titanium-phthalocyanine-chloride (TiPcCl2) were prepared by the thermal evaporation method.The molecular structure was studied by Raman spectrometer, showing a match between the spectra of the powder and the prepared films. The films' surface was examined by the atomic force microscope, revealing grain size and surface roughness of TiPcCl2 thin films to be 223 and 41 nm, respectively, for a 100 nm thickness. The energy gap was determined to be 1.5 eV, with no observable effect by the thickness change. Additionally, the linear and nonlinear optical constants were calculated from reflectance and transmittance measurements. The values of third nonlinear susceptibility are in order of 10 -12 esu, which is compatible with other phthalocyanines.The nonlinear optical constants indicate that TiPcCl2 films could also be used for optical laser limiters.

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“…In this regard, in particular, the nanoscale control of the Au film structure is crucial towards the determination of its properties in view of applications in functional nano-devices. For example, the roughness of deposited metal films is one of the most critical determining final electrical, optical and other properties of the systems [16][17][18][19][20][21][22][23][24][25]. As examples: (a) one of the key issue in the modern integrated circuit technology is the dramatic increase in metallic interconnect resistivity with decreasing cross section thickness.…”

Section: Introductionmentioning

confidence: 99%

Morphological Characteristics of Au Films Deposited on Ti: A Combined SEM-AFM Study

Ruffino

Grimaldi

2018

Coatings

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Deposited Au films and coatings are, nowadays, routinely used as active or passive elements in several innovative electronic, optoelectronic, sensing, and energy devices. In these devices, the physical properties of the Au films are strongly determined by the films nanoscale structure. In addition, in these devices, often, a layer of Ti is employed to promote adhesion and, so, influencing the nanoscale structure of the deposited Au film. In this work, we present experimental analysis on the nanoscale cross-section and surface morphology of Au films deposited on Ti. In particular, we sputter-deposited thick (>100 nm thickness) Au films on Ti foils and we used Scanning Electron Microscopy to analyze the films cross-sectional and surface morphology as a function of the Au film thickness and deposition angle. In addition, we analyzed the Au films surface morphology by Atomic Force Microscopy which allowed quantifying the films surface roughness versus the film thickness and deposition angle. The results establish a relation between the Au films cross-sectional and surface morphologies and surface roughness to the film thickness and deposition angle. These results allow setting a general working framework to obtain Au films on Ti with specific morphological and topographic properties for desired applications in which the Ti adhesion layer is needed for Au.

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The influence of surface roughness on electronic transport in thin films

Cited by 17 publications

References 14 publications

Annealing Effects on Py/Cu GMR Multilayer Films with Limited Number of Sublayers

Annealing Effects on Py/Cu GMR Multilayer Films with Limited Number of Sublayers

Preparation, Raman spectroscopy, surface morphology and optical properties of TiPcCl2 nanostructured films: thickness effect

Morphological Characteristics of Au Films Deposited on Ti: A Combined SEM-AFM Study

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