1979
DOI: 10.1109/irps.1979.362878
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The Influence of Plastic Encapsulants and Passivation Layers on the Corrosion of Thin Aluminium Films Subjected to Humidity Stress

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Cited by 23 publications
(7 citation statements)
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“…100% relative humidity). From a review of this literature, the failure modes dependent on moisture and ionic contamination are bond pad corrosion [20,[60][61][62] and MOSFET threshold voltage shifts, which may be caused by damage to the gate oxide from ionic contamination or water-enhanced charged-carrier injection [63][64][65][66].…”
Section: Current and Future Ageing Testsmentioning
confidence: 99%
“…100% relative humidity). From a review of this literature, the failure modes dependent on moisture and ionic contamination are bond pad corrosion [20,[60][61][62] and MOSFET threshold voltage shifts, which may be caused by damage to the gate oxide from ionic contamination or water-enhanced charged-carrier injection [63][64][65][66].…”
Section: Current and Future Ageing Testsmentioning
confidence: 99%
“…Al Al+++ + 3e E [12] 3H + 3e = 3/2H2, [13] and the chemical dissolution reaction by summation is Al + 3H -AlH± + 3/2 H2. [14] Reactions at Negative Metallization: With application of a bias, H2 will be evolved at the negative Al track which will make the originally near-neutral solution alkaline, according to Eq.…”
Section: Anodical Dissolution Versusgasevolutionmentioning
confidence: 99%
“…Incorporated ionic contaminants including Br − , Cl − , Na + , K + and so on can change the character of the solution to be more reactive and therefore speed up the process massively [2, 6, 7, 11, 17, 18]. Multiple potential sources of ionic species have been detected in semiconductor device manufacturing [10, 15, 19], which can be divided into process‐related sources (e.g. residues from etching), material‐related sources (e.g.…”
Section: Introductionmentioning
confidence: 99%
“…the environment. Since soft‐moulds are highly hydrophilic and hence absorb moisture, ions in solution can easily diffuse through the encapsulant and attack the underlying metal structures [19, 20].…”
Section: Introductionmentioning
confidence: 99%