The Influence of Annealing and Film Thickness on the Specific Properties of Co40Fe40Y20 Films

Abstract

Cobalt Iron Yttrium (CoFeY) magnetic film was made using the sputtering technique in order to investigate the connection between the thickness and annealing procedures. The sample was amorphous as a result of an insufficient thermal driving force according to X-ray diffraction (XRD) examination. The maximum low-frequency alternate-current magnetic susceptibility (χac) values were raised in correlation with the increased thickness and annealing temperatures because the thickness effect and Y addition improved the spin exchange coupling. The best value for a 50 nm film at annealing 300 °C for χac was 0.20. Because electron carriers are less constrained in their conduction at thick film thickness and higher annealing temperatures, the electric resistivity and sheet resistance are lower. At a thickness of 40 nm, the film’s maximum surface energy during annealing at 300 °C was 28.7 mJ/mm2. This study demonstrated the passage of photon signals through the film due to the thickness effect, which reduced transmittance. The best condition was found to be 50 nm with annealing at 300 °C in this investigation due to high χac, strong adhesion, and low resistivity, which can be used in magnetic fields.

Investigation of Sm Addition on Microstructural and Optical Properties of CoFe Thin Films

“…The significance of the work is investigating surface roughness in order to study the relationship between surface energy and magnetic-optical properties in CoFeSm thin films of various thicknesses and annealed at different temperatures. Moreover, the outcome of the present study is compared with the magnetic and adhesive characteristics of Cobalt Iron Vanadium (CoFeV), Cobalt Iron Tungsten (CoFeW), and Cobalt Iron Ytterbium (CoFeYb), and Cobalt Iron Yttrium (CoFeY) in Table 1 [15][16][17][18][19][20].…”