The growth and chemical structure of thin photonic films formed from plasma copolymerization. Part II. Effect of monomer feed location

Jiang, Hao; Grant, John T.; Eyink, Kurt G.; Tullis, S.; Enlow, Jesse; Bunning, Timothy J.

doi:10.1016/j.polymer.2005.06.051

Cited by 14 publications

(12 citation statements)

References 30 publications

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“…Hydrogen is not detected in XPS. The high F/C ratio of the OFCB monomer (F/C = 2:1) compared to the PP-OFCB films (F/C = approximately 1.5:1) indicates that defluorination takes place during the plasma reactions, presumably through C-F bond cleavage which influences the formation of a branched structure [16,31]. A weak vibration band at 2950 cm − 1 indicates the incorporation of hydrogen as aliphatic structural units in the final PECVD films.…”

Section: Pp-ofcb Filmsmentioning

confidence: 99%

The relationship between chemical structure and dielectric properties of plasma-enhanced chemical vapor deposited polymer thin films

et al. 2007

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Section: Pp-ofcb Filmsmentioning

confidence: 99%

The relationship between chemical structure and dielectric properties of plasma-enhanced chemical vapor deposited polymer thin films

et al. 2007

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“…The refractive index is the most fundamental optical property of a polymer for photonic applications. It is interesting to note that compared to trends recently reported for PcoP-OFCB/benzene films, [33,34] the refractive index of the PcoP-OFCB/HMDSO films exhibited a nonlinear variation with monomer feed ratio. For the former, the refractive index varied linearly from 1.38 to 1.65 with monomer feed ratio, F/(F þ B), where F was the OFCB volume flow rate and B was the benzene volume flow rate.…”

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confidence: 66%

“…[33] The refractive index (n) of these PcoP films could be controlled by adjusting the monomer feed ratio and feed location. [34][35][36][37] It was found that the refractive index increases linearly with the component atomic ratio in the films, f/( f þ c) ( f: fluorine and c: carbon), between the two limits (1.38-1.65) of the plasma-homopolymerized (PP) films.…”

Section: Introductionmentioning

confidence: 99%

“…This phenomenon is similar to what has been observed for plasma copolymerization of benzene/OFCB. [34,35] The addition of a small amount of HMDSO (second monomer) worked as a catalyst to greatly promote the activation, polymerization, and defluorination of OFCB species. This implies that at low siloxane feed rates (in the first stage), the formation of the carbon crosslinked structure is mainly due to the contribution of reactive carbon species from OFCB molecules.…”

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PECVD Siloxane and Fluorine‐Based Copolymer Thin Films

Jiang¹,

Eyink²,

Grant³

et al. 2008

Chemical Vapor Deposition

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Plasma copolymerization is utilized to fabricate thin photonic films based on hexamethyldisiloxane (HMDSO, C 6 H 18 Si 2 O) and octafluorocyclobutane (OFCB, C 4 F 8 ). The structure of the plasma copolymerized films is examined by X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR), and the optical properties including refractive index, n, and extinction coefficient, k, are determined by spectroscopic ellipsometry. The refractive indices, which range from 1.38 to 1.54, can be manipulated by adjusting the volume ratio of the two monomers, HMDSO and OFCB, during the polymerization. A nonlinear relationship between the refractive index and extinction coefficient with comonomer feed ratio is observed. A strong initial increase in both n and k as the amount of HMDSO is increased is attributed to significant defluorination of the resultant polymer films coupled with the formation of a C-C rich crosslinked network. Once the network incorporates substantial amounts of Si-C and Si-O bonds, the refractive index starts to decrease slowly due to a lowering of the density. XPS and FTIR results confirm the changes in internal structure consistent with this mechanism.

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“…Argyrakis et al [7] employed CF x O y thin films as an anti-adhesion and structure release aide. Grant et al [8,9] examined the growth and structure of CF x O y thin films as a function of the C 4 F 8 gas inlet feed position relative to the plasma zone, while Ningel et al [10] characterised CF x O y thin films deposited onto substrates up to 250 mm in length, reporting that the films exhibited excellent surface homogeneity.…”

Section: Introductionmentioning

confidence: 99%

Characteristics and durability of fluoropolymer thin films

Cheneler

Bowen

Evans

et al. 2011

Polymer Degradation and Stability

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Keywords:Fluoropolymer Ellipsometry Atomic force microscopy X-ray photoelectron spectroscopy Wetting Solvent Etchant Aqueous solution pH Q1 a b s t r a c tThe use of plasma-polymerised fluoropolymer (CF x O y ) thin films in the manufacture of microelectromechanical systems (MEMS) devices is well-established, being employed in the passivation step of the deep reactive ion etching (DRIE) process, for example. This paper presents an investigation of the effect of exposure to organic and aqueous liquid media on plasma-polymerised CF x O y thin films. Atomic force microscopy (AFM), scanning electron microscopy (SEM), ellipsometry, X-ray photoelectron spectroscopy (XPS) and dynamic wetting measurements were all employed as characterisation techniques. Highly basic aqueous solutions, including known silicon etchants, were found to cause delamination via degradation of the countersurface below the CF x O y thin film. Films were found to be stable in organic solvents, acidic aqueous solutions and slightly basic aqueous solutions.

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The growth and chemical structure of thin photonic films formed from plasma copolymerization. Part II. Effect of monomer feed location

Cited by 14 publications

References 30 publications

The relationship between chemical structure and dielectric properties of plasma-enhanced chemical vapor deposited polymer thin films

The relationship between chemical structure and dielectric properties of plasma-enhanced chemical vapor deposited polymer thin films

PECVD Siloxane and Fluorine‐Based Copolymer Thin Films

Characteristics and durability of fluoropolymer thin films

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