2007
DOI: 10.1016/j.tsf.2006.10.126
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The relationship between chemical structure and dielectric properties of plasma-enhanced chemical vapor deposited polymer thin films

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Cited by 53 publications
(34 citation statements)
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References 31 publications
(38 reference statements)
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“…From the device perspective, this means that devices containing cis−β−ocimene dielectric films would experience relatively low leakage currents through the material. Independent of film thickness and deposition power, the field at which breakdown occurred, F b was above 1.2 MV cm −1 , which is comparable to that reported for plasma-deposited polypyrrole, at 1.5 MV cm −1  43, linalyl acetate, at 1.8 MV cm −116 , or octafluorocylcobutane, at 2 ± 0.5 MV cm −1  46. It has previously been shown that the F b of plasma-deposited thin film, in that instance benzene, can be significantly enhanced through fine-tuning of deposition parameters, e.g.…”
Section: Resultssupporting
confidence: 75%
See 1 more Smart Citation
“…From the device perspective, this means that devices containing cis−β−ocimene dielectric films would experience relatively low leakage currents through the material. Independent of film thickness and deposition power, the field at which breakdown occurred, F b was above 1.2 MV cm −1 , which is comparable to that reported for plasma-deposited polypyrrole, at 1.5 MV cm −1  43, linalyl acetate, at 1.8 MV cm −116 , or octafluorocylcobutane, at 2 ± 0.5 MV cm −1  46. It has previously been shown that the F b of plasma-deposited thin film, in that instance benzene, can be significantly enhanced through fine-tuning of deposition parameters, e.g.…”
Section: Resultssupporting
confidence: 75%
“…It has previously been shown that the F b of plasma-deposited thin film, in that instance benzene, can be significantly enhanced through fine-tuning of deposition parameters, e.g. where monomer is introduced into the deposition reactor, deposition rate and deposition pressure, etc., which presents an opportunity to further optimise the F b of cis−β−ocimene films46.…”
Section: Resultsmentioning
confidence: 99%
“…Low pressure plasma enhanced chemical vapor deposition (PECVD) is nowadays one of the most widespread tools for the effective coatings deposition on substrates . Several studies have been already performed with the aim to investigate the characteristics of plasma‐polymerized acrylic acid (pPAA) films deposited by means of PECVD technology.…”
Section: Introductionmentioning
confidence: 99%
“…In this case, the dielectric permittivity also increases with increasing the plasma power. Recently, an analogous study was carried out for plasma polymerized films using benzene and octaflurocyclobutane as monomers 13. Up to now, the mechanism of plasma polymerization is poorly understood.…”
Section: Introductionmentioning
confidence: 99%