2000
DOI: 10.1016/s0040-6090(00)01081-6
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The formation of CdTe thin films by the stacked elemental layer method

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Cited by 17 publications
(9 citation statements)
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“…The same kinds of results were observed on the surface of thin films prepared by ablation of a hot-pressed powder target ZnTe with Nd:YAG laser [24,25]. Also, a 20 % increase in the film thickness of the stack is expected after completion of the reaction due to the difference between the molar volumes of the ZnTe compound and the Te/Zn bilayers [26]. In order to understand the change in film thickness after annealing while using the SEL method, the cross sectional image of the stacks before and after annealing was recorded and presented in Fig.…”
Section: Morphological Studiessupporting
confidence: 60%
“…The same kinds of results were observed on the surface of thin films prepared by ablation of a hot-pressed powder target ZnTe with Nd:YAG laser [24,25]. Also, a 20 % increase in the film thickness of the stack is expected after completion of the reaction due to the difference between the molar volumes of the ZnTe compound and the Te/Zn bilayers [26]. In order to understand the change in film thickness after annealing while using the SEL method, the cross sectional image of the stacks before and after annealing was recorded and presented in Fig.…”
Section: Morphological Studiessupporting
confidence: 60%
“…X-ray diffraction pattern of vacuum annealed InSb bilayer thin film having thickness, 3000-1500 Å. values (from ASTM cards) of vacuum annealed In-Sb thin film with their planes are shown in table 3. Similar effect has been observed by Cruz and de Avillez (2000) in the case of CdTe, ZnSe (Singh and Vijay 2004) and InSb (Singh and Vijay 2005). Present observed results are in good agreement with XRD pattern observed by Masaaki et al (1991) for In-Sb with variation of substrate temperature.…”
Section: X-ray Diffraction Analysissupporting
confidence: 80%
“…sputtering (Milyazaki et al 1991), MBE (Chyi et al 1989), CVD (Chang and Bedair 1985), flash evaporation (Carroland and Spivak 1966) and vacuum evaporation (Asauskas et al 1980). The stack elemental layer deposition method has been used for CdTe by Cruz and de Avillez (2000), copper indium diselenide thin films by Carter et al (1987), ZnSe and InSb thin films by Singh and Vijay (2004) and AlSb thin films by Singh and Vijay (2005). It is particularly suitable for deposition of compound semiconductor thin films, as it provides good control of composition (Singh and Vijay 2004).…”
Section: Introductionmentioning
confidence: 99%
“…The layers were deposited by thermal evaporation technique (PVD) using E306A vacuum system. Taking into consideration that the number of atoms in Te and Cd layers must be identical, the relation between the thicknesses of elemental layers is specified as Te/Cd = 1.53 [12]. Spec-pure Cd (99.999 %) and Te (99.9999 %) were evaporated in three different sequences using glass substrates at room temperature.…”
Section: Methodsmentioning
confidence: 99%