1975
DOI: 10.1007/bfb0043168
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The electrical resistivity of pure and gas covered metal films

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Cited by 55 publications
(23 citation statements)
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“…Conducting elements on an atom chip are usually fabricated as a film and thereby may have significant residual resistivity relative to bulk metals. Lattice and surface disorder in metal films, which is mainly due to grain structure and gas absorption, results in the increase of ρ 0 [19].…”
Section: Materials Dependence Of Magnetic Noisementioning
confidence: 99%
“…Conducting elements on an atom chip are usually fabricated as a film and thereby may have significant residual resistivity relative to bulk metals. Lattice and surface disorder in metal films, which is mainly due to grain structure and gas absorption, results in the increase of ρ 0 [19].…”
Section: Materials Dependence Of Magnetic Noisementioning
confidence: 99%
“…On the other hand, fundamental studies in surface physics [1,2] have shown that one can also measure adsorption or deposition processes at single crystal metal surfaces under speci®c circumstances by registering the surface resistance of the substrate. In particular, a large variety of voltammetric techniques has been developed for following interfacial processes of the analyte of interest such as heterogeneous charge transfer and adsorptionadesorption at electrodes.…”
Section: Introductionmentioning
confidence: 99%
“…In particular, a large variety of voltammetric techniques has been developed for following interfacial processes of the analyte of interest such as heterogeneous charge transfer and adsorptionadesorption at electrodes. On the other hand, fundamental studies in surface physics [1,2] have shown that one can also measure adsorption or deposition processes at single crystal metal surfaces under speci®c circumstances by registering the surface resistance of the substrate. This phenomenon can be explained with the help of the Fuchs-Sondheimer model [3,4]: The surface resistance of a single crystalline, perfectly smooth metal exposed to the vacuum originates from the specular re¯ection of conduction electrons of the metal.…”
Section: Introductionmentioning
confidence: 99%
“…The model suggested by Warkusz 1: is true for K > and a < 1, which has been emphasized in the conclusion. 1 ;o c(ug)] (7) where/.tg I/F(). Warkusz 16 has shown that the consistency between the value of film resistivity 01" calculated from Eq.…”
mentioning
confidence: 99%
“…Warkusz 16 has shown that the consistency between the value of film resistivity 01" calculated from Eq. (7) and that calculated from Eq. (6) is good (does not exceed 0.1%) in a wide range of the parameters and/.t.…”
mentioning
confidence: 99%