Semi‐insulating
normalGaAs
crystals were grown by liquid phase epitaxy from a Ga solution doped with Cr metal. The room temperature resistivity of the layers was
10−2∼107 normalΩ·normalcm
, depending on the doping concentration of Cr, the background donor concenetration, arsenic vapor pressure, and the cooling rate. It was found that the grown layers became semi‐insulating only when the background donor concentration of the undoped layer is lower than
1.0 ×1015 cm−3
. Higher arsenic vapor pressure and the higher cooling rate give layers with higher resistivity. The threshold voltage, at which the
I–V
curve changes from linear to
V3∼4
dependence, varies with the square of the thickness with electron injecting contacts. The activation energy obtained from the temperature dependence of resistivity increases as the room temperature resistivity increases. The highest obtained was 0.71 eV.