2004
DOI: 10.1016/s0257-8972(03)00665-0
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The effects of r.f. power and substrate temperature on the properties of ZnO films

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Cited by 83 publications
(40 citation statements)
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“…The obtained band gap at *3.28-3.26 eV is comparable to the values reported for ZnO thin films deposited by RF [8,11,15,23].…”
Section: Optical Characterizationsupporting
confidence: 84%
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“…The obtained band gap at *3.28-3.26 eV is comparable to the values reported for ZnO thin films deposited by RF [8,11,15,23].…”
Section: Optical Characterizationsupporting
confidence: 84%
“…Several techniques have been used to grow ZnO films, such as pulsed laser deposition [3], DC reactive magnetron sputtering [4,5], atomic layer deposition [6], electron beam evaporation [12], sol-gel [13], and spray pyrolysis [14]. In this context, reactive radio-frequency (RF) magnetron sputtering is an attractive alternative method for growing ZnO films because of the more accurate thickness control and a higher uniformity compared with other thin-film deposition techniques [15,16]. The properties of the ZnO films deposited by RF magnetron sputtering depend on the deposition parameters involved in the growth process, such as the RF power, sputtering gas pressure, gas flow rate, and temperature.…”
Section: Introductionmentioning
confidence: 99%
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“…Band gaps of E g ¼ 3:23eV (d = 300 nm) and E g ¼ 3:27eV (d = 340 nm) were obtained from Tauc curves for pure and Ce-doped films, respectively. Band gap values of $ 3.23-3.26 eV have been previously reported for RF deposited ZnO films (Al-Kuhaili et al 2012;Lin et al 2004;Bouderbala et al 2009;Zhu et al 2011). Optical absorption studies show that the absorption edge of the doped films shifts towards blue region with a widening of the band gap at a higher energy.…”
Section: Characterization Techniquesmentioning
confidence: 75%
“…Several techniques have been used to grow ZnO films, such as pulsed laser deposition (Sachet et al 2013), DC reactive-magnetron sputtering (Suchea et al 2006;Logothetidis et al 2008), atomic layer deposition (Frölich and Wegener 2011), ZnO films deposited by RF magnetron sputtering depend on the deposition parameters involved in the growth process, such as the RF power, sputtering gas pressure, gas flow rate, and temperature. By adjusting these processing parameters, ZnO films with properties that are compatible with optical devices may be obtained (Al-Kuhaili et al 2012;Lin et al 2004;Kim et al 2010b;Kapustianyk et al 2007). Additionally, doping with selective elements can induce changes in the structural, electrical, optical, and electronic properties of ZnO films (Morinaga et al 1997;Kim et al 2010a;Joshi et al 2010).…”
Section: Introductionmentioning
confidence: 99%