2012
DOI: 10.1016/j.apsusc.2012.05.045
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The effects of magnetic field on pulsed laser deposition of Mg-doped ZnO thin films

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Cited by 8 publications
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“…Mg:ZnO thin films could be grown on Al 2 O 3 (0001) substrates due to good lattice match between the (002) plane of hexagonal Mg:ZnO and (0006) plane of Al 2 O 3 . Several deposition techniques have been developed for the preparation of Mg doped ZnO thin films (Chen and Yu, ; Park et al, ; Ravichandran et al, ). In the present study, direct current (dc) magnetron sputtering have been used for fabrication of pure ZnO and Mg doped ZnO thin films for its advantages: low substrate temperature (down to room temperature), good adhesion, high deposition rates, good thickness uniformity and high density, good controllability, and long‐term stability of the process (Shin et al, ).…”
Section: Introductionmentioning
confidence: 99%
“…Mg:ZnO thin films could be grown on Al 2 O 3 (0001) substrates due to good lattice match between the (002) plane of hexagonal Mg:ZnO and (0006) plane of Al 2 O 3 . Several deposition techniques have been developed for the preparation of Mg doped ZnO thin films (Chen and Yu, ; Park et al, ; Ravichandran et al, ). In the present study, direct current (dc) magnetron sputtering have been used for fabrication of pure ZnO and Mg doped ZnO thin films for its advantages: low substrate temperature (down to room temperature), good adhesion, high deposition rates, good thickness uniformity and high density, good controllability, and long‐term stability of the process (Shin et al, ).…”
Section: Introductionmentioning
confidence: 99%