1995
DOI: 10.1016/1350-4487(95)00014-6
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The effect of thermal annealing on defect structure and thermoluminescence in LiF:Mg,Cu,P

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Cited by 12 publications
(2 citation statements)
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“…All measurements were conducted in a nitrogen atmosphere with low constant heating rate of 1 K/s and 513.15 K maximum temperature avoid sensitivity changes due to high annealing temperature. The annealing before irradiation was done using the procedure: 10 minutes heating in oven at 513.15 K, cooling at room temperature [23]. In laboratory measurement, room lighting is provided by Illford DL10 lamps equipped with Ilford #902 filters [18,19] in order to minimize the effects of optical bleaching [24].…”
Section: Methodsmentioning
confidence: 99%
“…All measurements were conducted in a nitrogen atmosphere with low constant heating rate of 1 K/s and 513.15 K maximum temperature avoid sensitivity changes due to high annealing temperature. The annealing before irradiation was done using the procedure: 10 minutes heating in oven at 513.15 K, cooling at room temperature [23]. In laboratory measurement, room lighting is provided by Illford DL10 lamps equipped with Ilford #902 filters [18,19] in order to minimize the effects of optical bleaching [24].…”
Section: Methodsmentioning
confidence: 99%
“…The TLDs signals after irradiation were acquired with a heating rate of 1 K/s from RT to 513.15 K in a nitrogen atmosphere, in order to prevent sensitivity changes due to high temperature. The signal bleaching before irradiation was performed by heating the TLD in the oven at 513.15 K for 10 min and by cooling it down at room temperature [17,18]. During the luminescence acquisitions, the laboratory was illuminated by using Ilford DL10 lamps filtered with Ilford #902 [19,20] in order to avoid any optical bleaching [20].…”
Section: Calibration Dosimeter Proceduresmentioning
confidence: 99%