The effect of the H2/(H2 + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition

Fang, Taojun; Yamaki, Kenji; Koga, Kazunori; Yamashita, Daisuke; Seo, Hyunwoong; Itagaki, Naho; Shiratani, Masaharu; Takenaka, Kosuke; Setsuhara, Yuichi

doi:10.1016/j.tsf.2018.02.035

Cited by 4 publications

(3 citation statements)

References 59 publications

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“…The thickness, surface roughness, and mass density of DLC films were deduced by a scanning electron microscope (SEM, JEOL, JIB-4600F) and a microbalance (Mettler Toledo, UMX2). 14) CNPs were collected on grids for a high-resolution transmission electron microscope (TEM). Their size and number density per area were measured with a TEM (JEM-2010) at four different places of the grid.…”

mentioning

confidence: 99%

Low-stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition

Hwang

Okumura²,

Kamataki³

et al. 2020

Jpn. J. Appl. Phys.

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Carbon nanoparticles (CNPs) incorporated diamond-like carbon (DLC) films have been fabricated by a combination of rf sputtering and plasma chemical vapor deposition. Spherical CNPs with a mean size of 21.2 nm are sandwiched between DLC layers with a mass density of 1.7 g cm−3. The film stress is decreased to 119 MPa, by depositing the CNPs over the base DLC layer at a surface coverage of 10.7%. This reduction is approximately half of that without CNPs. Raman spectroscopy indicates the insertion of CNPs barely alters the bonding structure of the upper DLC layer.

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confidence: 99%

Low-stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition

Hwang

Okumura²,

Kamataki³

et al. 2020

Jpn. J. Appl. Phys.

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“…Also, the O1s Spectra of plasma‐coated aramid fiber with toluene precursor, similar to the pristine aramid fibers shows the characteristic peaks of 531.17 and 531.79 related to the OCO and OCN follow decreasing in the intensity of OCN peak. The results indicate in deposition of diamond‐like carbon coating on the surface of aramid fibers 43–47 …”

Section: Resultsmentioning

confidence: 92%

“…This peak is mainly related to graphite-like structures. Also, the O1s Spectra of plasma-coated aramid fiber with toluene precursor, similar to the pristine aramid fibers shows the characteristic peaks of 531.17 [43][44][45][46][47] The survey spectrum of plasma-coated aramid fibers with acetonitrile precursor shows an increase in the C/O atomic ratio and a decrease in the C/N atomic ratio which suggest the formation of new carbon nitride on the surface of aramid fibers. Figure 6C,D shows the spectrum of plasma-coated aramid fiber by acetonitrile precursor.…”

Section: Chemical Structures and Compositionsmentioning

confidence: 78%

A promising method for promoting interfacial adhesion of aramid/rubber composite using atmospheric pressure plasma surface modification

Shakerinasab,

Bavi,

Balagna

et al. 2024

Polymer Composites

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Today, aramid fibers are well known as a high‐performance and ideal material for reinforcement purposes in rubber product manufacturing including hoses, tires, cables, and conveyors composites. However, surface modification of aramid fiber is necessary to solve poor interfacial adhesion between aramid fibers and the rubber matrix. Accordingly, in the present study, the effect of the surface modification of aramid fibers using atmospheric pressure plasma treatment with different precursors on adhesion to the rubber matrix was investigated. For that, the plasma coating was conducted using argon as the main working gas, and toluene, acetonitrile, tetraethyl orthosilicate (TEOS), and hexamethyldisiloxane (HMDSO) as liquid precursors. The physical–chemical characterization of the layer confirmed the successful deposition of amorphous carbon, amorphous nitride‐carbon, SiO2, and Polydimethylsiloxane (PDMS)‐like coating layers on the surface of aramid fibers by using toluene, acetonitrile, TEOS, and HMDSO as precursors, respectively. Overall, the result showed that the plasma surface modifications with acetonitrile precursor leads to the increase in interfacial adhesion of aramid/rubber composite, while retaining the tensile strength, and flame resistance properties of aramid as original fibers. Notably, the results of this study confirm the potential use of atmospheric pressure plasma for surface modification of aramid yarn to produce functional aramid for use in rubber composites.Highlights The plasma‐coated aramid using HMDSO, TEOS, toluene, and acetonitrile precursors was prepared; and its effect on the tensile properties of aramid fiber as well as interfacial adhesion between aramid/rubber composite was investigated. The positive effect of atmospheric pressure plasma coating using HMDSO precursor on the tensile properties of aramid fiber was revealed. The positive effect of atmospheric pressure plasma coating using toluene and acetonitrile on the interfacial adhesion between aramid/rubber composite was revealed. The positive effect of atmospheric pressure plasma coating using TEOS precursor on the flam resistance property of aramid fiber was revealed. This study provides valuable insights into the effect of the different plasma‐coated organosilicon and hydrocarbon precursors on the interfacial adhesion between aramid/rubber composite.

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Structural and Mechanical Analysis of APCVD Deposited Diamond-Like Carbon Thin Films

Ghadai

Das

Kalita

et al. 2020

Silicon

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The effect of the H2/(H2 + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition

Cited by 4 publications

References 59 publications

Low-stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition

Low-stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition

A promising method for promoting interfacial adhesion of aramid/rubber composite using atmospheric pressure plasma surface modification

Structural and Mechanical Analysis of APCVD Deposited Diamond-Like Carbon Thin Films

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The effect of the H2/(H2 + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition

Cited by 4 publications

References 59 publications

Low-stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition

Low-stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition

A promising method for promoting interfacial adhesion of aramid/rubber composite using atmospheric pressure plasma surface modification

Structural and Mechanical Analysis of APCVD Deposited Diamond-Like Carbon Thin Films

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The effect of the H2/(H2 + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition