Low-stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition

Abstract

Carbon nanoparticles (CNPs) incorporated diamond-like carbon (DLC) films have been fabricated by a combination of rf sputtering and plasma chemical vapor deposition. Spherical CNPs with a mean size of 21.2 nm are sandwiched between DLC layers with a mass density of 1.7 g cm−3. The film stress is decreased to 119 MPa, by depositing the CNPs over the base DLC layer at a surface coverage of 10.7%. This reduction is approximately half of that without CNPs. Raman spectroscopy indicates the insertion of CNPs barely alters the bonding structure of the upper DLC layer.

Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method

“…Raman spectra clearly show the separated D (1350 cm −1 ), and G (1580 cm −1 ) bands. The area intensity ratio of D/G band was around 1.8; this indicates the structure of the CNPs were polymer like a-C:H [25,[28][29][30]. Similar spectra were also observed at other FRs.…”

“…The surface-modified nanoparticles showed multi-exciton generation, which is necessary to increase solar cells' efficiency [18]. We recently used MHDPCVD to produce carbon nanoparticles [23][24][25] and confirmed that pressure played an important role in size control [23]. These studies revealed the essential parameters for the size control, while the growth mechanism was unclear.…”

Influence of Heat Treatment on Corrosion Resistance of Sn/Mg Films Formed by PVD Method on Hot-Dip Galvanized Steel

“…One potential technique is thermal spray coatings using a stream of feedstocks which is dependent on the thermal expansion gradient between the top coat and the substrates [11,12]. Another promising method is physical vapor deposition (PVD) which provides various coating layers because it has few restrictions on source materials and the formation of multi-layers [13][14][15][16][17].…”