The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films

Patsalas, P.; Charitidis, Costas A.; Logothetidis, S.

doi:10.1016/s0257-8972(99)00606-4

Cited by 253 publications

(113 citation statements)

References 17 publications

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“…As can be seen, an increase in the deposition time and substrate temperature cause an increase of this quantity. The hardness and mechanical properties of films can be affected by different parameters such as grain size, crystallographic orientations, film density, lattice parameters, and stoichiometry [1,10,12,18]. Although the variation of grain size with the deposition time is not large, the increase of hardness can be attributed to (i) film growth (ii) the increase of density or elimination of voids, (iii) improvement of crystal quality with increasing deposition time.…”

Section: Surface Morphology and Edxmentioning

confidence: 99%

“…Titanium thin films have been widely used in different areas of semiconductor device technology because of their desirable mechanical properties, such as high hardness, good corrosion and wear resistance, metallurgical stability and seem to be the best replacement of polycrystalline Si in very large-scale integrated circuits [1][2][3][4]. For the development of new materials in MEMS application, in addition to their mechanical characteristics including high hardness and good elasticity, fine adhesion and low interface stresses may play an important role in long-term reliability problems [1].…”

Section: Introductionmentioning

confidence: 99%

“…For the development of new materials in MEMS application, in addition to their mechanical characteristics including high hardness and good elasticity, fine adhesion and low interface stresses may play an important role in long-term reliability problems [1]. Among different methods of titanium thin film preparation, including physical vapor deposition, plasma focus, chemical vapor deposition, electrochemical and chemical nitriding, sputtering, and ion implantation [1,[5][6][7][8][9][10][11][12][13][14][15][16][17], direct-current (DC) magnetron sputtering is a simple and most appropriate method. However, the mechanical properties and crystallographic structure of titanium thin film in this method * E-mail: vnsvenkatesan@gmail.com are strongly dependent on process parameters such as sputtering power, substrate temperature and sputtering pressure.…”

Section: Introductionmentioning

confidence: 99%

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Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application

Venkatesan¹,

Ramu

2016

Materials Science-Poland

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This work investigates the influence of titanium thin films on the mechanical properties of AA 2024 substrates. The Scanning Electron Microscope (SEM) measurements confirm that the surface morphology of Ti thin film depends on controlled deposition rate and the energy-dispersive X-ray (EDX) result reveals the uniform dispersion of Ti coating over the sample. Increase in film thickness on the material surface is connected with improved hardness, superior adhesion and minimum surface roughness which makes the coated material more prominent for MEMS application. It is also found that the XRD patterns of the Ti thin films are characterized by hexagonal close packed (HCP) structure with (1 1 1) as the preferred crystallographic orientation for the film of a thickness of 154 µm coated on the substrate at temperature of 673 K.

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Section: Surface Morphology and Edxmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application

Venkatesan¹,

Ramu

2016

Materials Science-Poland

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“…The application of PVD at low temperatures is difficult because of reduced ad-atom mobility, which decreases coating density leading to inferior mechanical performance 15 . In the Ion Beam Assisted Deposition (IBAD) process, PVD is combined with ion bombardment.…”

Section: Introductionmentioning

confidence: 99%

Effect of Low Temperature Nitriding of 100Cr6 Substrates on TiN Coatings Deposited by IBAD

et al. 2015

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In this paper we studied the influence of pre-treating the surface of 100Cr6 steel by ion beam nitriding at low temperature (380°C) on the surface topography and wear resistance of thin TiN coatings deposited by reactive ion beam assisted deposition. The specimens were characterized by grazing incidence X-ray diffraction, scanning electron microscopy and atomic force microscopy. The wear resistance of the TiN-coated specimens was evaluated by means of ball on disc tests. The results showed that application of a preliminary ion beam nitriding treatment slightly increased the surface roughness but improved the wear resistance of the 100Cr6 steel due to the formation of a diffusion zone containing the γ'-Fe 4 N nitride combined with the TiN coating.

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“…Las láminas delgadas de TiN han sido extensamente utilizadas como recubrimientos protectores debido a sus atractivas propiedades físicas como son: elevada dureza, alta temperatura de fusión (2930 º C) y gran estabilidad química y termodinámica (1). En el ámbito industrial, este tipo de recubrimientos se han utilizado con el fin de aumentar la vida de las herramientas de corte y de otras piezas en las que se pretende mejorar su resistencia a la fricción y al desgaste, reduciéndose así las paradas de producción.…”

Section: Introductionunclassified

Depósito de TiN sobre herramientas de corte para uso industrial

Auger¹,

Sánchez²,

Albella³

2004

Bol. Soc. Esp. Ceram. Vidr.

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En este trabajo se han estudiado láminas de TiN crecidas sobre cuchillas de acero inoxidable empleadas en el corte de fibra de vidrio, para mejorar sus propiedades mecánicas y aumentar el tiempo de vida de la herramienta, reduciendo de este modo las paradas de producción. La técnica de depósito utilizada ha sido la de sputtering magnetrón reactivo. La composición química de las capas de TiN ha sido determinada mediante medidas de Espectroscopía Auger, RBS (Rutherford Backscattering Spectroscopy) y XANES (X-Ray Spectroscopy Near the Absorption Edge) y se ha relacionado con la composición de la mezcla gaseosa presente en la cámara de reacción. La estructura cristalina se ha determinado mediante Difracción de Rayos X, y mediante la técnica de SEM (Scanning Electron Microscopy) se ha observado la morfología de las capas. La dureza del recubrimiento se ha calculado a partir de medidas de nanoindentación, obteniéndose un valor de 21.54±1.04 GPa, típico en la literatura para el TiN. Los resultados de la prueba en fábrica de las cuchillas recubiertas muestran un aumento en su tiempo de vida de hasta un 67%. Palabras clave: Sputtering magnetrón reactivo, TiN, propiedades mecánicas, dureza TiN deposition on cutting tools for industrial useTiN coatings on stainless steel blades for glass fibre cutting have been investigated in this work. The aim was to improve their mechanical properties and increase the tool time life, decreasing in this way the production stops. Reactive magnetron sputtering has been the deposition technique. TiN films chemical composition has been determined by AES (Auger Electron Spectroscopy), RBS (Rutherford Backscattering Spectroscopy) and XANES (X-Ray Spectroscopy Near the Absorption Edge), and it has been correlated to the gas mixture composition in the vacuum chamber. Crystalline structure has been determined by X-Ray Diffraction, and the films morphology has been observed by SEM (Scanning Electron Microscopy). The hardness coating has been extracted from nanoindentation measurements, giving a 21.54±1.04 GPa hardness value, typical for TiN in the literature. Factory proofs for coated cutting blades show a 67% lifetime increase.Keywords: Reactive magnetron sputtering; TiN, mechanical properties, hardness INTroduccIóNLas láminas delgadas de TiN han sido extensamente utilizadas como recubrimientos protectores debido a sus atractivas propiedades físicas como son: elevada dureza, alta temperatura de fusión (2930 º C) y gran estabilidad química y termodinámica (1). En el ámbito industrial, este tipo de recubrimientos se han utilizado con el fin de aumentar la vida de las herramientas de corte y de otras piezas en las que se pretende mejorar su resistencia a la fricción y al desgaste, reduciéndose así las paradas de producción. El objetivo del trabajo presentado es la obtención de capas de TiN mediante técnicas de sputtering reactivo con el fin de conseguir recubrimientos, sobre cuchillas de corte de fibra de vidrio, con durezas elevadas y con una adherencia y resistencia al desgaste que las haga direct...

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The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films

Cited by 253 publications

References 17 publications

Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application

Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application

Effect of Low Temperature Nitriding of 100Cr6 Substrates on TiN Coatings Deposited by IBAD

Depósito de TiN sobre herramientas de corte para uso industrial

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