The effect of substrate bias voltage on the electrochemical corrosion behaviors of thin film deposited on stainless steel by r. f magnetron sputtering

Madaoui, N.; Saoula, Nadia; Kheyar, K.; Nezar, Sawsen; Tadjine, R.; Hammouche, A.; Belhousse, S.

doi:10.1134/s2070205117030157

Cited by 6 publications

(3 citation statements)

References 46 publications

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“…The slope of the Mott-Schottky plot gives the donor density (Table VIII), N D , and the value estimated was (1.71 × 10 22 cm −3 ) for ZnO (1 min) being the highest and for ZnO (9 min) with (2.97 × 10 22 cm 3 ) being the lowest. This slight difference in donor density comes from surface defects and oxygen vacancies in ZnO thin films, which may be associated with a reduction in the electron transport along the oxide [76]. These results are in agreement with those obtained in the EIS analysis.…”

Section: Resultssupporting

confidence: 90%

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Effect of deposition time on properties of the ZnO by USD Method

Madaoui,

Azibi,

Djabrouhou

et al. 2024

Rev. Mex. Fís.

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This investigation aims to improve the properties of 304 L stainless steel (SS) substrates for use in corrosion, mechanical, and biomedical applications by depositing ZnO thin films. The ultrasonic spraying technique was used to prepare ZnO thin films with depositional times of 1, 4, and 9 minutes. XRD and Raman studied the surface characteristics of ZnO samples. XRD analysis revealed a hexagonal structure with an average crystallite size of 22 nm for ZnO. Indentation nano measurements indicated an increase in the hardness of the films examined. To determine the type of conductivity and estimate the charge carrier density, potentiodynamic polarization, electrochemical impedance spectroscopy (EIS), and Mott-Schottky analysis were performed. The thin film deposited for 9 minutes was found to be the most effective in improving corrosion resistance.

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Section: Resultssupporting

confidence: 90%

“…In photocatalytic activity, a high donor density value implies a higher carrier concentration, which is related to better conductivity in the films. A high donor density value is normally associated with higher conductivities, enhancing electron effectiveness and hole transport at the electrode interface [76].…”

Section: Resultsmentioning

confidence: 99%

Effect of deposition time on properties of the ZnO by USD Method

Madaoui,

Azibi,

Djabrouhou

et al. 2024

Rev. Mex. Fís.

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“…. ) presents characteristic defects such as pinholes, microcracks and macroparticles which are generated during the deposition by PVD method [25]. In fact, the defects on the PVD films consist of preferential paths to the diffusion of aggressive species into the substrate under the protective films and it could express these defects by estimate the porosity electrochemically.…”

Section: Methodsmentioning

confidence: 99%

The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

Azibi

Saoula

Aknouche

2019

Journal of Electrical Engineering

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In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-frequency (rf) magnetron sputtering from a pure zirconium target in Ar - N2 gas mixture. The substrate bias voltage was varied from 0 to −100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarization.

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