2006
DOI: 10.1063/1.2170066
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The effect of stress-induced anisotropy in patterned FeCo thin-film structures

Abstract: In this work, 1-μm-thick FeCo films with −320MPa compressive stress and FeCo∕NiFe films with 600MPa tensile stress were patterned into 5×20μm2 elements. The stress anisotropy resulting from patterning was measured using x-ray diffraction to be 220MPa for the tensile films and −170MPa for the compressive films and is in agreement with finite element modeling. Scanning electron microscopy with spin-polarization analysis imaging shows that the domain structure of the elements was influenced by this stress-induced… Show more

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Cited by 14 publications
(8 citation statements)
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“…This stress is on par with previous values of stress in sputtered FeCo films. 27 For the films grown under strain, this initial compressive force will become tensile upon release. Although the strain in the films on PIN−PMN−PT will be different, these results indicate that the deposition alone is enough to impart a significantly large stress and thus plastically deform the metal films.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…This stress is on par with previous values of stress in sputtered FeCo films. 27 For the films grown under strain, this initial compressive force will become tensile upon release. Although the strain in the films on PIN−PMN−PT will be different, these results indicate that the deposition alone is enough to impart a significantly large stress and thus plastically deform the metal films.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…Spin wave generation is through applying an alternating voltage at the top metal contact, which results in oscillating strain in the piezoelectric layer that creates magnetoelastic spin wave excitation [16]. Detection of spin waves is through the reverse process from magnetic to electric domain [13], [17].…”
Section: A Physical Componentsmentioning
confidence: 99%
“…The general view of the device structure is shown in Fig.3(a). A Co 30 Fe 70 film (saturation magnetization of 2.2 T) was deposited by high vacuum rfsputtering system on silicon substrate and covered by 300nm silicon oxide. There are two microstrips (asymmetric coplanar strip transmission lines), on the top of the structure.…”
Section: Experimental Data and Numerical Simulationsmentioning
confidence: 99%
“…The bias voltage can be applied across the structure using the gate electrode and a conducting ferromagnetic layer (CoFe, or NiFe, for example). The stress produced by the piezoelectric results in the easy axis rotation in the piezomagnetic material [30]. In Fig.1(d) we have schematically shown a magnetoelectric cell consists of a piezoelectric (e.g.…”
mentioning
confidence: 99%