2008
DOI: 10.1016/j.tsf.2008.06.027
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The effect of sputter-deposited TiO2 passivating layer on the performance of dye-sensitized solar cells based on sol–gel derived photoelectrode

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Cited by 39 publications
(20 citation statements)
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“…Finally the obtained film was annealed at 500qC. The DSC was fabricated by soaking the ZnO film with dye: cis-di (thiocyanate) bis (2,2c-bipyridyl-4, 4c-di-carboxylate) ruthenium (II), the electrolyte: 0.5 M KI, 0.05 M I 2 and 0.05 M 4-tert-butylpridine and carbon counter electrode [17]. The active cell area was 0.3 cm 2 .…”
mentioning
confidence: 99%
“…Finally the obtained film was annealed at 500qC. The DSC was fabricated by soaking the ZnO film with dye: cis-di (thiocyanate) bis (2,2c-bipyridyl-4, 4c-di-carboxylate) ruthenium (II), the electrolyte: 0.5 M KI, 0.05 M I 2 and 0.05 M 4-tert-butylpridine and carbon counter electrode [17]. The active cell area was 0.3 cm 2 .…”
mentioning
confidence: 99%
“…The majority of investigations deal, however, with TiO 2 blocking layers prepared by various methods. Spray pyrolysis is most commonly used, [4][5][6][7]11] but also sol-gel techniques, screen-printing [16], radio frequency magnetron sputtering of Ti followed by oxidation [17] and reactive sputtering of TiO 2 [18][19][20] have been applied.…”
mentioning
confidence: 99%
“…4 [29]. The maximum IPCE of DSSCs was 31.2% for dumbbell-shaped hexagonal and 34.5% for aligned ZnO NRAs.…”
Section: Dye Sensitized Solar Cell Applications Of Zno Nanostructuresmentioning
confidence: 91%