2013
DOI: 10.1557/opl.2013.1004
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The Effect of Soft Pre-Annealing of Differently Stacked Cu-Sn-Zn Precursors on the Quality of Cu2ZnSnSe4 Absorbers

Abstract: Cu2ZnSnSe4 p-type semiconductors currently investigated for use in thin film solar cells can be synthesized by firstly depositing a metallic precursor and secondly annealing the precursor in selenium vapor. Differently stacked Cu-Sn-Zn metallic precursors were characterized after a soft annealing at 350°C under nitrogen atmosphere. For the stack where the Sn and Zn were in direct contact with sufficient Cu to form a stable alloy, a bi-layered structure consisting of Cu-Sn on the bottom and Cu-Zn on the top was… Show more

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Cited by 6 publications
(8 citation statements)
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“…In terms of phase composition, these results are consistent with previous literature 11 . However, the low magnification micrograph reveals that the segregated alloys reach a size of 10-20 m, which is one order of magnitude larger than previously reported.…”
Section: Please Do Not Adjust Marginssupporting
confidence: 93%
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“…In terms of phase composition, these results are consistent with previous literature 11 . However, the low magnification micrograph reveals that the segregated alloys reach a size of 10-20 m, which is one order of magnitude larger than previously reported.…”
Section: Please Do Not Adjust Marginssupporting
confidence: 93%
“…However, since the metal deposition is sequential, the films do have a strong vertical compositional gradient (the stack is composed of 200 nm Cu, 240 nm Sn, 180 nm Zn). When such a stack is used, it was shown by Ahmed et al 10 and explained by Arasimowicz et al 11 that a soft annealing step under inert atmosphere leads to the formation of micron sized columnar Cu-Zn and Cu-Sn alloys.…”
Section: Please Do Not Adjust Marginsmentioning
confidence: 99%
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“…Because the stacking sequence of the precursor and the alloying process are different from those used in refs. [20,21], only Cu 6 Zn 5 is preferred alloy phase in sample B-2.…”
Section: Tailoring the Formation Of The Mose 2 Layermentioning
confidence: 96%
“…The recent refinement of the duration of the pre‐alloying step by Matsumura's group in Japan has allowed the achievement of the current 8% world record efficiency for a pure sulfide kesterite electrodeposited device . These results highlight the importance of the precursor microstructure for the formation of kesterite absorber films with reduced secondary phase segregation . Likewise, the choice of electrochemical deposition sequence itself has crucial implications in the determination of the precursor microstructure .…”
Section: Introductionmentioning
confidence: 99%