2008
DOI: 10.1016/j.surfcoat.2008.06.158
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The effect of nitrogen pressure on cathodic arc deposited NbN thin films

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Cited by 52 publications
(26 citation statements)
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References 34 publications
(55 reference statements)
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“…Similarly, NbN based films also have been widely used in the field of microelectronics [1,2]. Due to their high hardness, good toughness, and excellent corrosion resistance, NbN based films are most suitable for using as functional films, especially on the surface of mould and on cutting tools for surface modifications.…”
Section: Introductionmentioning
confidence: 99%
“…Similarly, NbN based films also have been widely used in the field of microelectronics [1,2]. Due to their high hardness, good toughness, and excellent corrosion resistance, NbN based films are most suitable for using as functional films, especially on the surface of mould and on cutting tools for surface modifications.…”
Section: Introductionmentioning
confidence: 99%
“…Previous researches on NbN film mainly focus on the superconducting properties [4]. NbN film is widely used in industry of cutting tools recently, since its thermal expansion coefficient can match to tool steels well [5].…”
Section: Introductionmentioning
confidence: 99%
“…Due to their high critical current density, good mechanical properties and transition temperature between 16 and 17 K, NbN x films could be successfully used in several superconducting microelectronics applications [1]. NbN x thin films have been produced by various deposition techniques including reactive magnetron sputtering [2], ion beam assisted deposition [3], pulsed laser deposition [4] and cathodic arc deposition [5,6]. Only few studies on NbN were emphasized on its mechanical properties.…”
Section: Niobium Nitride Films Have Good Mechanicalmentioning
confidence: 99%