1984
DOI: 10.1109/t-ed.1984.21721
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The effect of high fields on MOS device and circuit performance

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Cited by 278 publications
(64 citation statements)
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“…For deep submicron MOSFETs velocity saturation at sufficiently large lateral fields creates a serious limitation of the device performance [6], [7]. In that case, the saturation drain current becomes linearly dependent on the gate overdrive voltage, instead of quadratic and can be approximated by 163:…”
Section: Velocity Saturation and Overshootmentioning
confidence: 99%
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“…For deep submicron MOSFETs velocity saturation at sufficiently large lateral fields creates a serious limitation of the device performance [6], [7]. In that case, the saturation drain current becomes linearly dependent on the gate overdrive voltage, instead of quadratic and can be approximated by 163:…”
Section: Velocity Saturation and Overshootmentioning
confidence: 99%
“…This is the more true for low temperature operation, which can increase the mobility degradation and the series resistance [5]. At the same time, high transverse and high lateral field effects become important [6] and carrier velocity saturation starts to limit the drive current [7]-[g]. At cryogenic temperatures andlor for sub 100 nm devices, even velocity overshoot has been demonstrated experimentally [9]-[Ill.…”
Section: Introductionmentioning
confidence: 99%
“…Assuming source is grounded, the drain current I D at the onset of velocity saturation can be modeled as [7]:…”
Section: Operation Under Velocity Saturationmentioning
confidence: 99%
“…Device performance is modeled using compact low-voltage Transregional MOSFET models [11,12] ( Figs 7,8,9) that predict circuit performance in the sub-threshold, saturation and linear regions of operation providing continuous and smooth transitions across region boundaries. High fieldeffects on carrier mobility are incorporated by adopting the mobility reduction model in [13]. Smoothness and continuity of the drain current expressions in the triode, saturation and the subthreshold regions are obtained by requiring differentiability and continuity of the product of the effective mobility and the areal charge density of inversion layer carriers.…”
Section: Circuit and Device Modelsmentioning
confidence: 99%