The effect of gas injection on a thermal argon plasma flow in a water-cooled tube

A dynamic pulsed plasma reactor (DPPR) capable of chemical vapor deposition of advanced materials on substrates located in a supersonic expansion nozzle is described. The DPPR combines plasma, shock tube, and supersonic expansion nozzle techniques in obtaining vapor phase quenching rates of 107–108 K/s for nanometric particle size formation. Deposition of Ti(s) and TiN(s) from Ar–TiCl4, Ar–H2–TiCl4, and N2–H2–TiCl4 reactants were experimentally investigated with deposition products characterized by scanning electron microscopy, atomic force microscopy, and energy dispersive x-ray analytical techniques. Theoretical gas dynamics describing wave motion and propagation of reactants in the DPPR are presented and resulted in identifying deposition mechanisms of homogeneous and heterogeneous nucleation for Ti(s) and TiN(s) on Pyrex substrates, respectively. This article describes reactor design, operating characteristics, and theoretical wave dynamics in the experimental system.

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The effect of gas injection on a thermal argon plasma flow in a water-cooled tube

Cited by 4 publications

References 14 publications

Experimental study of effective particle heating by a thermal plasma flow confined in a porous ceramic tube

Experimental study of effective particle heating by a thermal plasma flow confined in a porous ceramic tube

Heat transfer—a review of 1985 literature

Dynamic pulsed plasma reactor for chemical vapor deposition of advanced materials

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