2010
DOI: 10.1002/app.32450
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The effect of gamma irradiation on electrical characteristics of Au/polyvinyl alcohol (Co, Zn‐doped)/n‐Si Schottky barrier diodes

Abstract: To show the effect of gamma radiation, Au/ Polyvinyl Alcohol (Co, Zn-doped)/n-Si Schottky barrier diodes (SBDs) were exposed to 60 Co c-ray source at room temperature. These structures were investigated by using current-voltage (I-V), capacitance-voltage (C-V), and conductance-voltage (G/x-V) measurement methods before and after irradiation. The C-V and G/x-V measurements were carried out at 1 MHz. The density of interface states (N ss ) as a function of E c -E ss was obtained from the forward bias I-V data by… Show more

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Cited by 21 publications
(13 citation statements)
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References 40 publications
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“…The magnitudes of these peaks decrease with increasing frequency. The frequency dependence of Rs is attributed to the particular distribution density of interface states [14,28,39]. The series resistance of all irradiated samples has increased .The increase of series resistance after radiation is attributed to the decrease of carriers' mobility and carriers' removal effect [40].…”
Section: Accepted Manuscriptmentioning
confidence: 90%
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“…The magnitudes of these peaks decrease with increasing frequency. The frequency dependence of Rs is attributed to the particular distribution density of interface states [14,28,39]. The series resistance of all irradiated samples has increased .The increase of series resistance after radiation is attributed to the decrease of carriers' mobility and carriers' removal effect [40].…”
Section: Accepted Manuscriptmentioning
confidence: 90%
“…As grown samples have low leakage current compared to irradiated ones. Such increase has been attributed to the increase of generation recombination centers and image force barrier lowering [9,14]. Reverse leakage current also exhibits strong dependence on the N concentration.…”
Section: Accepted Manuscriptmentioning
confidence: 99%
“…Over the last decade, various types of metal‐insulator‐semiconductor (MIS) structures have been investigated vastly by many researchers . Metal‐polymer‐semiconductor (MPS) structures are used as an alternative to conventional MIS structures.…”
Section: Introductionmentioning
confidence: 99%
“…Metal‐polymer‐semiconductor (MPS) structures are used as an alternative to conventional MIS structures. Main reason of using MPS structures is that having an organic interfacial layer between metal and semiconductor, rather than an inorganic one, leads to improvements in the electrical and dielectric properties of the structure . Also, the fact that MPS structures exhibit characteristics that are similar to those of MIS structures allows us to obtain the electrical characteristics of MPS structures the same way we obtain those of MIS structures.…”
Section: Introductionmentioning
confidence: 99%
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