The effect of diborane additive on the plasma-chemical properties of deposited carbon films

Shubina, E. N.; Karasev, P. A.; Titov, A.I.; Podsvirov, O. A.; Vinogradov, A. Ya.; Karasev, N. N.; Pozdnyakov, A. V.

doi:10.1134/s1063785017010114

Cited by 5 publications

(1 citation statement)

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“…Interest in obtaining boron-containing coatings is determined by the prospects of their use for goals of modifying the surface properties of a wide range of parts and equipment. First of all, boron-based coatings are resistant to mechanical wear [1,2], corrosion [3], have significant thermal stability [4] and a low friction coefficient [5]. Boron-containing coatings have high hardness [6].…”

Section: Introductionmentioning

confidence: 99%

Magnetron sputtering and electron beam evaporation systems for pure boron thin film coatings

Nikolaev

Окс²,

Tyunkov³

et al. 2022

J. Phys.: Conf. Ser.

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Deposition of boron-containing coatings is determined by their promising use for surface modification goals. In this work, we consider the equipment for the implementation of two plasma methods for the deposition of thin films of pure boron on the surface. These are a magnetron sputtering with a crystalline boron target heated in the discharge, and a system of an evaporation of pure boron target by an electron beam generated using forevacuum plasma source. The features of functioning, and operating parameters of these devices are presented. The deposition rate of boron coatings on the samples was about 20 nm/min for magnetron sputtering. The boron film deposition rate was significantly higher and reached 1 µm / min.

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