Abstract:Deposition of boron-containing coatings is determined by their promising use for surface modification goals. In this work, we consider the equipment for the implementation of two plasma methods for the deposition of thin films of pure boron on the surface. These are a magnetron sputtering with a crystalline boron target heated in the discharge, and a system of an evaporation of pure boron target by an electron beam generated using forevacuum plasma source. The features of functioning, and operating parameters … Show more
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