The effect of d.c. glow discharge on hot filament chemical vapor deposition of diamond

Song, Bok Han; Yoon, Duk Yong

doi:10.1016/s0925-9635(99)00249-6

Diamond and Related Materials

2000

DOI: 10.1016/s0925-9635(99)00249-6

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The effect of d.c. glow discharge on hot filament chemical vapor deposition of diamond

Bok Han Song¹,

Duk Yong Yoon²

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Cited by 8 publications

References 31 publications

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A new polarised hot filament chemical vapor deposition process for homogeneous diamond nucleation on Si(100)

Cojocaru

Larijani

Misra³

et al. 2004

Diamond and Related Materials

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International audienceA new hot filament chemical vapor deposition with direct current plasma assistance (DC HFCVD) chamber has been designed for an intense nucleation and subsequent growth of diamond films on Si(100).Growth process as well as the If(V) characteristics of the DC discharge are reported. Gas phase constituents activation was obtained by a stable glow discharge between two grid electrodes coupled with two sets of parallel hot filaments settled in-between and polarised at the corresponding plasma potential. The sample is negatively biased with a small 10-15 V extraction potential with respect to the cathode grid.Such design allows to create a high density of both ions and radicals that are extracted and focussed onto the surface of the sample.The current density onto the sample can be finely tuned independently of the primary plasma.A homogeneous plasma fully covering the sample surface is visualized. Consequently, a high-density nucleation (>1010 cm-2) occurs

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A new polarised hot filament chemical vapor deposition process for homogeneous diamond nucleation on Si(100)

Cojocaru

Larijani

Misra³

et al. 2004

Diamond and Related Materials

View full text Add to dashboard Cite

show abstract

Diamond films grown without seeding treatment and bias by hot-filament CVD system

Ali

Ürgen

2012

Solid State Sciences

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Improved adhesion of diamond coating on cobalt-cemented tungsten carbide hardmetal by using pulsed-UV-laser substrate surface pretreatment

Lou

Dong

et al. 2002

Applied Surface Science

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The effect of d.c. glow discharge on hot filament chemical vapor deposition of diamond

Cited by 8 publications

References 31 publications

A new polarised hot filament chemical vapor deposition process for homogeneous diamond nucleation on Si(100)

A new polarised hot filament chemical vapor deposition process for homogeneous diamond nucleation on Si(100)

Diamond films grown without seeding treatment and bias by hot-filament CVD system

Improved adhesion of diamond coating on cobalt-cemented tungsten carbide hardmetal by using pulsed-UV-laser substrate surface pretreatment

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