Diamond films grown without seeding treatment and bias by hot-filament CVD system

Ali, Mubarak; Ürgen, Mustafa

doi:10.1016/j.solidstatesciences.2012.01.015

Cited by 4 publications

(6 citation statements)

References 35 publications

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“…The parameters studied while synthesizing a variety of carbon thin thick films are given below with SAMPLE name and so in the Figure captions of surface topography and fracture cross-section images. Further details of materials" specification, seeding treatment and the process are given elsewhere [14,28,[38][39][40][41]. The preparation procedure of unseeded silicon substrates is given elsewhere [14], whereas, a detailed process of preparing molybdenum-coated titanium substrates and temperature measurement are given in our previous study [39].…”

Section: Methodsmentioning

confidence: 99%

“…In Figure S5, we can observe such behaviours where crystallites grew protruding through the cavity at the surface of molybdenum-coated titanium substrate (in "a") and growth rate was higher along the edges of unseeded silicon substrate (in "b") revealing rich nucleation at the edges/corners of the substrate material. An ultrasonically treated surface of silicon substrate is an alternative way to achieve improved rate of nucleation where uniformly distributed pits acted as nucleation sites to deposit carbon atoms in graphitic state [14,38]. The rate of deposition of carbon atoms in evolving certain sized grains or crystallites become uniform at the later stage of the process and their faces start formulating smooth and faceted surface as long as operating under the fixed localized process parameters.…”

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confidence: 99%

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Switching dynamics of morphology-structure in chemically deposited carbon films – A new insight

Ali

Ürgen

2017

Carbon

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Carbon is one of the most investigated materials and shows chaotic behavior in terms of evolving structure. Synthesizing carbon materials largely depend on the deposition technique, process parameters, condition of substrate surface and ratio of the gaseous chemistry. A variety of techniques have been employed to depositing carbon films from various gaseous mixtures to different substrate materials.In this study, carbon thin and thick films are discussed for different techniques known as hot filament chemical vapor deposition and microwave plasma chemical vapor deposition where their synthesis process has been explained in a new context. Here, we discuss attained dynamics of atoms (or their tiny grains) amalgamating into a particular phase of grain or crystallite and electron-dynamics responsible for binding atoms in the formation of all sorts of tiny grains, grains and crystallites controlling overall morphology-structure of films thickness at few nanometers to several microns. Carbon atoms when in solid state, on amalgamation at flat surface result into bind under uniform electron-dynamics and when the amalgamation is at uneven surface, (even at atomic level) they result into bind under non-uniform electron-dynamics. Where binding of atoms is at uniform electron-dynamics, a graphitic structure evolves following by different modifications into other carbon phases depending on the orientation of electron Modified Final Version 2 states with respect to centre of inner part of atom known as nucleus. Substrates under appropriate surface defects or abrasion result into an improved rate of nucleation of tiny grains, hence, their increased rate of growth. This study embarks on unexplored science of carbon films where in addition to localized process parameters nature of substrate also influence dynamics of formation of tiny clusters, grains and crystallites at their initial stage of formation. Our results and discussions enlighten us to revisit the nucleation and growth mechanisms of different sorts of films deposit at any scale and at any substrate surface constituting different composition.

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Section: Methodsmentioning

confidence: 99%

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confidence: 99%

Switching dynamics of morphology-structure in chemically deposited carbon films – A new insight

Ali

Ürgen

2017

Carbon

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“…However, our earlier studies show that film synthesised with seeding treatment have higher growth rate (overall) compared to those grown without seeding treatment. 7,8 The higher growth rate for films synthesised at 3?0 vol.-%CH 4 is due to an increase in methyl radicals.…”

Section: Resultsmentioning

confidence: 99%

“…A detailed description of dry ultrasonic process is given in our previous work. 7,8 For comparison purposes, diamond films were also grown over seeded substrates along with substrates prepared by dry ultrasonic process. The average grain size of diamond powder was 5 mm, while the duration for seeding treatment was 10 min.…”

Section: Methodsmentioning

confidence: 99%

High purity diamond films synthesised by chemical vapour deposition

Ali

Ürgen

Kawashima

2012

Surface Engineering

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Defect free diamond films have tremendous potential in a variety of areas including optoelectronics and have been the focus of several studies. Before diamond growth, a seeding treatment to substrate is mandatory, which itself is a source of contamination and degrades the quality of diamond. In the present study, diamond films without seeding treatment were grown on silicon using hot filament chemical vapour deposition. As a result of dry ultrasonic process, the diamond film with continuous layer was grown over unseeded substrate. At nucleation stage, carbon containing species were trapped by the uniformly created network of pits. Film grown at 2?0 vol.-% CH 4 in H 2 and substrate temperature of 850uC showed higher purity than that grown at 3?0 vol.-%CH 4 in H 2 and substrate temperature of 1000uC. Films grown over seedless substrates were also compared with those grown with seeding treatment.

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“…Over the past decade, due to the outstanding physical and chemical characteristics such as high hardness, good optical transparency, excellent thermal conductivity and carrier mobility and very long free-carrier recombination lifetimes [1], single crystal diamond (SCD) prepared by chemical vapour deposition (CVD) has been widely applied as the precision cutting tools, the fabrication of gem stones and the transparent of optical window [2]. Recently, microwave plasma CVD (MPCVD) [3], hot filament CVD [4] and direct current arc plasma jet CVD (DC arc plasma jet CVD) [5] have been gradually developed for SCD fabrication, and the SCD products with large size and high quality had been successfully synthesised [6]. Many researches on the SCD synthesised by above methods have been carried out, such as the optimisation of deposition parameters [3], the growth mechanism [6] and rate [7], and the quality [8], mechanical [9] and optical performance of as-synthesised SCD [10].…”

Section: Introductionmentioning

confidence: 99%

Synthesis of multiple single crystal diamonds by DC-GD-CVD

Lyu

Wang

et al. 2019

Surface Engineering

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Multiple single crystal diamonds (SCDs) were first synthesised on 24 high pressure high temperature (HPHT) synthetic type Ib (100) SCD seeds by direct current glow discharge plasma chemical vapour deposition (DC-GD-CVD) system with gas mixture of CH 4 -H 2 -Ar.Owing to the increase of the formed plasma density and temperature caused by the addition of 1.2 vol.-% Ar gas, a high growth rate of 22.2 µm h −1 for diamonds deposition was achieved by the plasma with diameter of 2 inches at 900-950°C. After deposition for 50 h, diamond material with a thickness of about 1 mm was uniformly deposited on each seed. The average FWHM value, hardness and transmittance of as-obtained SCDs were 3.2 cm −1 , 105 GPa and 69.4%, revealing the high quality of multiple SCDs fabricated by the DC-GD-CVD method.

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Diamond films grown without seeding treatment and bias by hot-filament CVD system

Cited by 4 publications

References 35 publications

Switching dynamics of morphology-structure in chemically deposited carbon films – A new insight

Switching dynamics of morphology-structure in chemically deposited carbon films – A new insight

High purity diamond films synthesised by chemical vapour deposition

Synthesis of multiple single crystal diamonds by DC-GD-CVD

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