1999
DOI: 10.1002/(sici)1097-4628(19991227)74:14<3287::aid-app1>3.3.co;2-n
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The effect of curing history on the residual stress behavior of polyimide thin films

Abstract: ABSTRACT:The effect of curing history on the residual stress behaviors in semiflexible structure poly(4,4Ј-oxydiphenylene pyromellitimide) (PMDA-ODA) and rigid structure poly(p-phenylene biphenyltetracarboximide) (BPDA-PDA) polyimide was investigated. Depending upon the curing history and different structures of polyimide, the residual stress behaviors and the morphology of polyimide thin films were detected in situ by using a wafer bending technique and wide angle X-ray diffraction (WAXD), respectively. For t… Show more

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Cited by 2 publications
(4 citation statements)
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“…Here, curing processes were performed with the following cure schedules (illustrated in Table I): cure A: heated to 400°C at 30°C/min, and held at 400°C for 60 min, then cooled to 25°C; cure B: heated to 400°C at 2°C/min, held at 400°C for 60 min, and cooled to 25°C at 1°C/min; cure C: heated to 150°C for 30 min, 230°C for 30 min, 300°C for 30 min, and 400°C for 60 min, ramping rate at each step was 2°C/min, cooled to 1.0°C/min. The schematic bending apparatus, TFSA, [13][14][15][16][17] was used for the film stress measurements. The thickness of polyimide films was controlled to minimize the effect of thickness deviation.…”
Section: Residual Stress Measurementmentioning
confidence: 99%
“…Here, curing processes were performed with the following cure schedules (illustrated in Table I): cure A: heated to 400°C at 30°C/min, and held at 400°C for 60 min, then cooled to 25°C; cure B: heated to 400°C at 2°C/min, held at 400°C for 60 min, and cooled to 25°C at 1°C/min; cure C: heated to 150°C for 30 min, 230°C for 30 min, 300°C for 30 min, and 400°C for 60 min, ramping rate at each step was 2°C/min, cooled to 1.0°C/min. The schematic bending apparatus, TFSA, [13][14][15][16][17] was used for the film stress measurements. The thickness of polyimide films was controlled to minimize the effect of thickness deviation.…”
Section: Residual Stress Measurementmentioning
confidence: 99%
“…32 According to the previous studies, the degrees of chain orientation in PI films are higher for the PIs having rigid molecular structures than those having flexible molecular structures or bulky side groups. 11,[15][16][17][18][19][20]26,31 Furthermore, the preparation conditions of PI films such as film thickness, [13][14][15][16][17][21][22][23][24]27,30 thermal history, 15,17,25,33 and precursors of PIs 24,26 also affect the degrees of chain orientation. In the present study, we investigate the molecular structure dependence of the chain orientation and the rotational orientation of five-membered imide planes in aromatic PI films prepared by spin-coating onto substrates.…”
Section: Introductionmentioning
confidence: 99%
“…There have been a number of studies for investigating chain orientation and anisotropy in their properties such as coefficient of thermal expansion [11][12][13] (CTE), elastic modulus, 11,12 and refractive index. [14][15][16][17][18][19][20][21][22][23][24][25][26][27][28][29][30][31][32][33] The magnitude of anisotropies in these properties basically depends on two factors: the intrinsic anisotropy and the degree of orientation of polymers. For instance, anisotropy in refractive index, namely birefringence Dn, in a rotationally symmetrical system can be expressed as:…”
Section: Introductionmentioning
confidence: 99%
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