1996
DOI: 10.1063/1.363794
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The early stages of solid-state reactions in Ni/Al multilayer films

Abstract: Ni/Al multilayer films with pair thicknesses of 10 and 20 nm and with overall compositions in the range 48–88 at. % Al were prepared by sputtering. For comparison, Ni-Al alloy films in the same concentration range were prepared by co-deposition of the elements. The films were studied by x-ray diffraction, electron diffraction, and differential scanning calorimetry. It was found that the B2 NiAl phase with a metastable concentration of approximately 63 at. % Al was the first phase to grow upon annealing of the … Show more

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Cited by 104 publications
(58 citation statements)
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“…2. Similar two-step crystallization, first via lateral nucleation followed by thickening, could be found in several thin film silicide and aluminide forming systems [29][30][31][32][33][34][35] . For T ≥ 622 °C, a second phase transition takes place.…”
Section: A Controlling Pinhole Density With Choice Of Barrier Layersupporting
confidence: 66%
“…2. Similar two-step crystallization, first via lateral nucleation followed by thickening, could be found in several thin film silicide and aluminide forming systems [29][30][31][32][33][34][35] . For T ≥ 622 °C, a second phase transition takes place.…”
Section: A Controlling Pinhole Density With Choice Of Barrier Layersupporting
confidence: 66%
“…Rietveld analysis of the samples after the measurements reveals the presence of the L1 0 FePt and, in the case of the 2 h milled powder, additional Fe 3 Pt and FePt 3 phases. The apparent absence of a peak in the isothermal DSC measurements has been ascribed to transformations starting with fast nucleation from random positions followed by a comparatively slow diffusion-controlled growth [19] and [20]. Slow growth rates could be supported, for instance, by the data shown in Fig.…”
Section: Discussionmentioning
confidence: 86%
“…This is explained by the asymmetry of the interdiffusion coefficients, with Ni diffusing much more rapidly into Al than Al into Ni [22,23]. However, depending on the nominal composition of the multilayer and on the processing history, also different initial intermediate phases such as AlNi [19,20,[24][25][26], AlNi 3 [10] or a metastable Al 9 Ni 2 -phase [24,27] Argon flow for 2 min at 250°C. This temperature was chosen because it is close to the onset for the Al 3 Ni formation [12,14,17,18], and the duration was sufficiently short to avoid significant grain growth.…”
mentioning
confidence: 99%